Issued Patents All Time
Showing 76–100 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8821738 | Thermal annealing process | Phillip D. Hustad, Xinyu Gu, Shih-Wei Chang, Jeffrey D. Weinhold | 2014-09-02 |
| 8821739 | High temperature thermal annealing process | Xinyu Gu, Shih-Wei Chang, Phillip D. Hustad, Jeffrey D. Weinhold | 2014-09-02 |
| 8822124 | Underlayer composition and method of imaging underlayer composition | Phillip D. Hustad, Cynthia Pierre | 2014-09-02 |
| 8822130 | Self-assembled structures, method of manufacture thereof and articles comprising the same | Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray | 2014-09-02 |
| 8822133 | Underlayer composition and method of imaging underlayer | Phillip D. Hustad, Cynthia Pierre | 2014-09-02 |
| 8795774 | Hardmask | Deyan Wang, Jibin Sun, Peng-Wei Chuang, Cong Liu | 2014-08-05 |
| 8710150 | Blended block copolymer composition | Shih-Wei Chang, Valeriy V. Ginzburg, Erin B. Vogel, Daniel J. Murray, Phillip D. Hustad | 2014-04-29 |
| 8697810 | Block copolymer and methods relating thereto | Erin B. Vogel, Valeriy V. Ginzburg, Shih-Wei Chang, Daniel J. Murray, Phillip D. Hustad | 2014-04-15 |
| 7776506 | Coating compositions for photoresists | Deyan Wang, Michael K. Gallagher | 2010-08-17 |
| 7582585 | Coating compositions | Sungseo Cho, David L. Goff, J. Ioan Matthews, Hao Yun | 2009-09-01 |
| 7582360 | Coating compositions for use with an overcoated photoresist | Gerald B. Wayton, Suzanne M. Coley, Tomoki Kurihara | 2009-09-01 |
| 7326518 | Photoresist compositions | James F. Cameron, Dong Woo Lee, Gary J. Swanson, Jin Wuk Sung | 2008-02-05 |
| 7297616 | Methods, photoresists and substrates for ion-implant lithography | James F. Cameron, George G. Barclay, Jin Wuk Sung | 2007-11-20 |
| 7202009 | Polymers and photoresist compositions for short wavelength imaging | Gary N. Taylor, Charles R. Szmanda | 2007-04-10 |
| 7163751 | Coating compositions for use with an overcoated photoresist | Gerald B. Wayton, Suzanne M. Coley, Tomoki Kurihara | 2007-01-16 |
| 7118847 | Polymer and photoresist compositions | Charles R. Szmanda, George G. Barclay, Wang Yueh | 2006-10-10 |
| 7029821 | Photoresist and organic antireflective coating compositions | Richard J. Carey, Michael J. Kaufman | 2006-04-18 |
| 7026101 | Antireflective coating compositions | Manuel DoCanto, Edward K. Pavelchek | 2006-04-11 |
| 6907432 | Method and system for recycling materials | Charles R. Szmanda, Richard C. Hemond, Mark S. Thirsk, Leo L. Linehan, Anthony Zampini | 2005-06-14 |
| 6887648 | Antireflective coating compositions | Edward K. Pavelchek | 2005-05-03 |
| 6852466 | Photoresist compositions particularly suitable for short wavelength imaging | Gary N. Taylor | 2005-02-08 |
| 6852421 | Coating compositions for use with an overcoated photoresist | Gerald B. Wayton, Suzanne M. Coley, Tomoki Kurihara | 2005-02-08 |
| 6767689 | Antireflective coating compositions | Edward K. Pavelchek | 2004-07-27 |
| 6749765 | Aperture fill | Edward W. Rutter, Jr., Edward K. Pavelchek | 2004-06-15 |
| 6740467 | Photoresist compositions comprising blends of ionic and non-ionic photoacid generators | — | 2004-05-25 |