Issued Patents All Time
Showing 101–118 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6602652 | Antireflective coating compositions and exposure methods under 200 nm | Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith | 2003-08-05 |
| 6599677 | Polymer and photoresist compositions | Charles R. Szmanda, George G. Barclay, Wang Yueh | 2003-07-29 |
| 6461717 | Aperture fill | Edward W. Rutter, Jr., Edward K. Pavelchek | 2002-10-08 |
| 6410209 | Methods utilizing antireflective coating compositions with exposure under 200 nm | Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith | 2002-06-25 |
| 6406828 | Polymer and photoresist compositions | Charles R. Szmanda, George G. Barclay, Wang Yueh | 2002-06-18 |
| 6379861 | Polymers and photoresist compositions comprising same | Gary N. Taylor, George G. Barclay | 2002-04-30 |
| 6280911 | Photoresist compositions comprising blends of ionic and non-ionic photoacid generators | — | 2001-08-28 |
| 6136501 | Polymers and photoresist compositions comprising same | Gary N. Taylor, George G. Barclay | 2000-10-24 |
| 6110641 | Radiation sensitive composition containing novel dye | Charles R. Szmanda, Gerald C. Vizvary | 2000-08-29 |
| 5866299 | Negative photoresist composition | Charles R. Szmanda | 1999-02-02 |
| 5723254 | Photoresist with photoactive compound mixtures | Anthony Zampini, Pamela Turci, Catherine C. Meister, Gerald C. Vizvary | 1998-03-03 |
| 5589553 | Esterification product of aromatic novolak resin with quinone diazide sulfonyl group | Anthony Zampini | 1996-12-31 |
| 5529880 | Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound | Anthony Zampini | 1996-06-25 |
| 5350714 | Point-of-use purification | Richard J. Carey | 1994-09-27 |
| 5178986 | Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol | Anthony Zampini, David C. Madoux, Charles R. Szmanda | 1993-01-12 |
| 5164279 | Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol | Anthony Zampini, David C. Madoux | 1992-11-17 |
| 5128230 | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate | Michael K. Templeton, Anthony Zampini, James C. Woodbrey, David C. Madoux, Brian K. Daniels | 1992-07-07 |
| 4983492 | Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol | Anthony Zampini, David C. Madoux | 1991-01-08 |