Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and method for providing uniform flow of gas

Apparatus and method for providing uniform flow of gas

US Patent RE47440 · Granted Jun 18, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for cleaning a vessel2025
Apparatus for providing a gas mixture to a reaction chamber and method of using 2025
Process chamber shower head2025
Weighted lift pin2025
Rotary reactor for uniform particle coating with thin films2025
Self field-suppression CVD tungsten (W) fill on PVD W liner2025
Multi-antenna unit for large area inductively coupled plasma processing apparatu2025
Process chamber manifold2025
Thermal process chamber lid with backside pumping2025
Film stress control for plasma enhanced chemical vapor deposition2025
Method and system for depositing molybdenum layers2025
Methods for forming metal gapfill with low resistivity2025