Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8362571 | High compressive stress carbon liners for MOS devices | Qingguo Wu, James S. Sims, Mandyam Sriram, Seshasayee Varadarajan, Haiying Fu +2 more | 2013-01-29 |
| 8288292 | Depositing conformal boron nitride film by CVD without plasma | George Andrew Antonelli, Mandyam Sriram, Vishwanathan Rangarajan | 2012-10-16 |
| 8268722 | Interfacial capping layers for interconnects | Jengyi Yu, Hui-Jung Wu, Girish Dixit, Bart J. van Schravendijk, Gengwei Jiang +2 more | 2012-09-18 |
| 8110493 | Pulsed PECVD method for modulating hydrogen content in hard mask | Zhiyuan Fang, Jon Henri | 2012-02-07 |
| 7981777 | Methods of depositing stable and hermetic ashable hardmask films | Yongsik Yu, Zhiyuan Fang, Jon Henri | 2011-07-19 |
| 7981810 | Methods of depositing highly selective transparent ashable hardmask films | Zhiyuan Fang, Jon Henri | 2011-07-19 |
| 7915166 | Diffusion barrier and etch stop films | Yongsik Yu, Zhiyuan Fang, Jon Henri, Elizabeth Apen, Dan Vitkavage | 2011-03-29 |
| 7906817 | High compressive stress carbon liners for MOS devices | Qingguo Wu, James S. Sims, Mandyam Sriram, Seshasayee Varadarajan, Haiying Fu +2 more | 2011-03-15 |
| 7381644 | Pulsed PECVD method for modulating hydrogen content in hard mask | Zhiyuan Fang, Jon Henri | 2008-06-03 |