Issued Patents All Time
Showing 51–75 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7375798 | Projection system for EUV lithography | Hans-Jurgen Mann, Udo Dinger | 2008-05-20 |
| 7355678 | Projection system for EUV lithography | Hans-Jurgen Mann, Udo Dinger | 2008-04-08 |
| 7237915 | Catadioptric projection system for 157 nm lithography | — | 2007-07-03 |
| 7218445 | Microlithographic reduction projection catadioptric objective | David Shafer, Wilhelm Ulrich | 2007-05-15 |
| 7199922 | Reflective projection lens for EUV-photolithography | Hans-Juergen Mann, Wilhelm Ulrich | 2007-04-03 |
| 7190530 | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 | Hans-Jurgen Mann, Alexander Epple | 2007-03-13 |
| 7190527 | Refractive projection objective | Hans-Juergen Rostalski, Karl-Heinz Schuster, Wilhelm Ulrich, Rolf Freimann | 2007-03-13 |
| 7151592 | Projection system for EUV lithography | Hans-Jurgen Mann, Udo Dinger | 2006-12-19 |
| 7085075 | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 | Hans-Juergen Mann, Alexander Epple | 2006-08-01 |
| 7061959 | Laser thin film poly-silicon annealing system | William N. Partlo, Palash P. Das, Michael Thomas | 2006-06-13 |
| 7009140 | Laser thin film poly-silicon annealing optical system | William N. Partio, Palash P. Das, Michael Thomas | 2006-03-07 |
| 6985210 | Projection system for EUV lithography | Hans-Jurgen Mann, Udo Dinger | 2006-01-10 |
| 6927901 | Reflective projection lens for EUV-photolithography | Hans-Juergen Mann, Wilhelm Ulrich | 2005-08-09 |
| 6906866 | Compact 1½-waist system for sub 100 nm ArF lithography | Wilhelm Ulrich, Hans-Juergen Rostalski | 2005-06-14 |
| 6864861 | Image generator having a miniature display device | Kevin Schehrer, William J. Cassarly, Douglas J. McKnight, Jonathan R. Biles, Miller H. Schuck +1 more | 2005-03-08 |
| 6636350 | Microlithographic reduction projection catadioptric objective | David Shafer, Wilhelm Ulrich | 2003-10-21 |
| 6426506 | Compact multi-bounce projection system for extreme ultraviolet projection lithography | — | 2002-07-30 |
| 6318869 | High numerical aperture ring field projection system for extreme ultraviolet lithography | — | 2001-11-20 |
| 6262836 | High numerical aperture ring field projection system for extreme ultraviolet lithography | David Shafer | 2001-07-17 |
| 6226346 | Reflective optical imaging systems with balanced distortion | — | 2001-05-01 |
| 6204975 | Reflective micro-display system | Wayde Watters, Gregory Heacock | 2001-03-20 |
| 6188513 | High numerical aperture ring field projection system for extreme ultraviolet lithography | David Shafer | 2001-02-13 |
| 6183095 | High numerical aperture ring field projection system for extreme ultraviolet lithography | — | 2001-02-06 |
| 6147818 | Projection optics box | Layton Hale, Terry N. Malsbury, John M. Parker | 2000-11-14 |
| 6072852 | High numerical aperture projection system for extreme ultraviolet projection lithography | — | 2000-06-06 |