Issued Patents All Time
Showing 201–225 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7641840 | Method for expelling gas positioned between a substrate and a mold | Mahadevan GanapathiSubramanian, Yeong-Jun Choi, Mario Johannes Meissl | 2010-01-05 |
| 7636999 | Method of retaining a substrate to a wafer chuck | Anshuman Cherala, Daniel Babbs | 2009-12-29 |
| 7635263 | Chucking system comprising an array of fluid chambers | Anshuman Cherala, Pankaj Lad, Steven C. Shackleton | 2009-12-22 |
| 7635445 | Method of separating a mold from a solidified layer disposed on a substrate | Anshuman Cherala, Yeong-Jun Choi, Mario Johannes Meissl, Sidlgata V. Sreenivasan, Norman E. Schumaker +3 more | 2009-12-22 |
| 7630067 | Interferometric analysis method for the manufacture of nano-scale devices | Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Philip D. Schumaker, Daniel Babbs +1 more | 2009-12-08 |
| 7491637 | Formation of conductive templates employing indium tin oxide | Sidlgata V. Sreenivasan, Ian McMackin, Ronald D. Voisin | 2009-02-17 |
| 7462028 | Partial vacuum environment imprinting | Anshuman Cherala, Pankaj Lad, Ian McMackin | 2008-12-09 |
| 7442336 | Capillary imprinting technique | Sidlgata V. Sreenivasan, Michael Watts | 2008-10-28 |
| 7432634 | Remote center compliant flexure device | Sidlgata V. Sreenivasan, Stephen C. Johnson | 2008-10-07 |
| 7420654 | Method of varying dimensions of a substrate during nano-scale manufacturing | Anshuman Cherala, Pawan Kumar Nimmakayala, Mario Johannes Meissl, Sidlgata V. Sreenivasan | 2008-09-02 |
| 7387508 | Compliant device for nano-scale manufacturing | Sidigata V. Sreenivasan | 2008-06-17 |
| 7374415 | Apparatus to control displacement of a body spaced-apart from a surface | Sidlgata V. Sreenivasan, Stephen C. Johnson | 2008-05-20 |
| 7338275 | Formation of discontinuous films during an imprint lithography process | Mario Johannes Meissl, Sidlagata V. Sreenivasan, Michael Watts | 2008-03-04 |
| 7323130 | Magnification correction employing out-of-plane distortion of a substrate | Pawan Kumar Nimmakayala, Sidlgata V. Sreenivasan, Anshuman Cherala | 2008-01-29 |
| 7316554 | System to control an atmosphere between a body and a substrate | Yeong-Jun Choi | 2008-01-08 |
| 7303383 | Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks | Sidlgata V. Sreenivasan, Matthew E. Colburn, Todd C. Bailey | 2007-12-04 |
| 7298456 | System for varying dimensions of a substrate during nanoscale manufacturing | Anshuman Cherala, Pawan Kumar Nimmakayala, Mario Johannes Meissl, Sidlgata V. Sreenivasan | 2007-11-20 |
| 7292326 | Interferometric analysis for the manufacture of nano-scale devices | Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Philip D. Schumaker, Daniel Babbs | 2007-11-06 |
| 7252715 | System for dispensing liquids | Michael Watts, Sidlgata V. Sreenivasan | 2007-08-07 |
| 7229273 | Imprint lithography template having a feature size under 250 nm | Todd C. Bailey, Matthew E. Colburn, Sidlgata V. Sreenivasan, Carlton G. Willson, John Ekerdt | 2007-06-12 |
| 7224443 | Imprint lithography substrate processing tool for modulating shapes of substrates | Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael Watts, Daniel Babbs, Mario Johannes Meissl +2 more | 2007-05-29 |
| 7186483 | Method of determining alignment of a template and a substrate having a liquid disposed therebetween | Sidlgata V. Sreenivasan, Matthew E. Colburn, Todd C. Bailey | 2007-03-06 |
| 7179079 | Conforming template for patterning liquids disposed on substrates | Sidlgata V. Sreenivasan, Ronald D. Voisin | 2007-02-20 |
| 7170589 | Apparatus to vary dimensions of a substrate during nano-scale manufacturing | Anshuman Cherala, Pawan Kumar Nimmakayala, Mario Johannes Meissl, Sidlgata V. Sreenivasan | 2007-01-30 |
| 7157036 | Method to reduce adhesion between a conformable region and a pattern of a mold | Frank Y. Xu, Nicholas A. Stacey, Van Xuan Hong Truskett, Michael Watts | 2007-01-02 |