Issued Patents All Time
Showing 126–150 of 198 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6412437 | Plasma enhanced chemical vapor deposition reactor and plasma enhanced chemical vapor deposition process | Philip Campbell, Craig M. Carpenter, Allen Mardian | 2002-07-02 |
| 6398923 | Multiple species sputtering method | P. J. Ireland, Howard E. Rhodes, Sukesh Sandhu, Tim O'Brien, Tim Johnson | 2002-06-04 |
| 6395128 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Gurtej S. Sandhu, Paul Smith, Mei Chang | 2002-05-28 |
| 6388284 | Capacitor structures | Howard E. Rhodes, Lyle Breiner, Philip J. Ireland, Trung T. Doan, Gurtej S. Sandhu | 2002-05-14 |
| 6368988 | Combined gate cap or digit line and spacer deposition using HDP | Weimin Li, Gurtej S. Sandhu | 2002-04-09 |
| 6362088 | Method of forming ohmic conductive components in a single chamber process | Gurtej S. Sandhu | 2002-03-26 |
| 6340499 | Method to increase gas residence time in a reactor | Gurtej S. Sandhu, Ravi Iyer | 2002-01-22 |
| 6340637 | Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants | Ravi Iyer | 2002-01-22 |
| 6335282 | Method of forming a titanium comprising layer and method of forming a conductive silicide contact | Gurtej S. Sandhu | 2002-01-01 |
| 6331482 | Method of VLSI contact, trench, and via filling using a germanium underlayer with metallization | Jeffrey W. Honeycutt | 2001-12-18 |
| 6331493 | Process for making low dielectric constant dielectric films | — | 2001-12-18 |
| 6309967 | Method of forming a contact | Jeffrey W. Honeycutt | 2001-10-30 |
| 6306766 | Method of forming a crystalline phase material, electrically conductive line and refractory metal silicide | Gurtej S. Sandhu, Chris Hill | 2001-10-23 |
| 6291289 | Method of forming DRAM trench capacitor with metal layer over hemispherical grain polysilicon | Howard E. Rhodes, Lyle Breiner, Philip J. Ireland, Trung T. Doan, Gurtej S. Sandhu | 2001-09-18 |
| 6291341 | Method for PECVD deposition of selected material films | Gurtej S. Sandhu | 2001-09-18 |
| 6291358 | Plasma deposition tool operating method | Gurtej S. Sandhu | 2001-09-18 |
| 6284651 | Method for forming a contact having a diffusion barrier | Varatharajan Nagabushnam | 2001-09-04 |
| 6268282 | Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks | Gurtej S. Sandhu | 2001-07-31 |
| 6258724 | Low dielectric constant dielectric films and process for making the same | — | 2001-07-10 |
| 6255216 | Methods of forming a contact having titanium silicide and titanium formed by chemical vapor deposition | Trung T. Doan, Gurtej S. Sandhu, Kirk D. Prall | 2001-07-03 |
| 6255209 | Methods of forming a contact having titanium formed by chemical vapor deposition | Trung T. Doan, Gurtej S. Sandhu, Kirk D. Prall | 2001-07-03 |
| 6239029 | Sacrificial germanium layer for formation of a contact | Jeffrey W. Honeycutt | 2001-05-29 |
| 6235646 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Gurtej S. Sandhu, Paul Smith, Mei Chang | 2001-05-22 |
| 6227141 | RF powered plasma enhanced chemical vapor deposition reactor and methods | Gurtej S. Sandhu, Paul Smith | 2001-05-08 |
| 6229213 | Germanium alloy electrical interconnect structure | Jeffrey W. Honeycutt | 2001-05-08 |