PC

Philip Campbell

Micron: 32 patents #586 of 6,345Top 10%
Overall (All Time): #114,229 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 25 most recent of 32 patents

Patent #TitleCo-InventorsDate
7468104 Chemical vapor deposition apparatus and deposition method Allen Mardian, Craig M. Carpenter, Randy Mercil, Sujit Sharan 2008-12-23
7422986 Deposition methods utilizing microwave excitation Craig M. Carpenter, Ross S. Dando 2008-09-09
7396570 Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Cem Basceri, Irina Vasilyeva, Ammar Derraa, Gurtej S. Sandhu 2008-07-08
7393563 Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Cem Basceri, Irina Vasilyeva, Ammar Derraa, Gurtej S. Sandhu 2008-07-01
7329292 Process byproduct trap and system including same Allen Mardian 2008-02-12
7311947 Laser assisted material deposition Ross S. Dando, Dan Gealy, Craig M. Carpenter, Allen Mardian 2007-12-25
7270715 Chemical vapor deposition apparatus Ross S. Dando, Craig M. Carpenter, Allen Mardian 2007-09-18
7234412 Semiconductor substrate deposition processor chamber liner apparatus Craig M. Carpenter, Ross S. Dando, Allen Mardian, Gurtej S. Sandhu 2007-06-26
7229666 Chemical vapor deposition method Allen Mardian, Craig M. Carpenter, Randy Mercil, Sujit Sharan 2007-06-12
7192487 Semiconductor substrate processing chamber and accessory attachment interfacial structure Craig M. Carpenter, Ross S. Dando, Allen Mardian, Kevin Hamer, Raynald Cantin +2 more 2007-03-20
7185601 Chemically sensitive warning apparatus and method Craig M. Carpenter, Allen Mardian, Ross S. Dando 2007-03-06
7105208 Methods and processes utilizing microwave excitation Craig M. Carpenter, Ross S. Dando 2006-09-12
7044997 Process byproduct trap, methods of use, and system including same Allen Mardian 2006-05-16
7033642 Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer Cem Basceri, Irina Vasilyeva, Ammar Derraa, Gurtej S. Sandhu 2006-04-25
6858264 Chemical vapor deposition methods Ross S. Dando, Craig M. Carpenter, Allen Mardian 2005-02-22
6849133 CVD apparatuses and methods of forming a layer over a semiconductor substrate Craig M. Carpenter, Ross S. Dando, Kevin Hamer 2005-02-01
6845734 Deposition apparatuses configured for utilizing phased microwave radiation Craig M. Carpenter, Ross S. Dando 2005-01-25
6814813 Chemical vapor deposition apparatus Ross S. Dando, Craig M. Carpenter, Allen Mardian 2004-11-09
6800172 INTERFACIAL STRUCTURE FOR SEMICONDUCTOR SUBSTRATE PROCESSING CHAMBERS AND SUBSTRATE TRANSFER CHAMBERS AND FOR SEMICONDUCTOR SUBSTRATE PROCESSING CHAMBERS AND ACCESSORY ATTACHMENTS, AND SEMICONDUCTOR SUBSTRATE PROCESSOR Craig M. Carpenter, Ross S. Dando, Allen Mardian, Kevin Hamer, Raynald Cantin +2 more 2004-10-05
6787373 Method of replacing at least a portion of semiconductor substrate deposition process kit hardware, and method of depositing materials over a plurality of semiconductor substrates Ross S. Dando, Craig M. Carpenter, Allen Mardian, Gurtej S. Sandhu 2004-09-07
6767823 Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Cem Basceri, Irina Vasilyeva, Ammar Derraa, Gurtej S. Sandhu 2004-07-27
6758911 Apparatus and process of improving atomic layer deposition chamber performance David J. Kubista 2004-07-06
6734051 Plasma enhanced chemical vapor deposition methods of forming titanium silicide comprising layers over a plurality of semiconductor substrates Cem Basceri, Irina Vasilyeva, Ammar Derraa, Gurtej S. Sandhu 2004-05-11
6730355 Chemical vapor deposition method of forming a material over at least two substrates Ammar Derraa, Cem Basceri, Irina Vasilyeva, Gurtej S. Sandhu 2004-05-04
6716284 Apparatus and process of improving atomic layer deposition chamber performance David J. Kubista 2004-04-06