Issued Patents All Time
Showing 151–175 of 198 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6208033 | Apparatus having titanium silicide and titanium formed by chemical vapor deposition | Trung T. Doan, Gurtej S. Sandhu, Kirk D. Prall | 2001-03-27 |
| 6184136 | Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants | Ravi Iyer | 2001-02-06 |
| 6171943 | Methods of forming a contact having titanium silicide formed by chemical vapor deposition | Trung T. Doan, Gurtej S. Sandhu, Kirk D. Prall | 2001-01-09 |
| 6159867 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Gurtej S. Sandhu, Paul Smith, Mei Chang | 2000-12-12 |
| 6143620 | Semiconductor processing method of providing a roughened polysilicon film and a capacitor construction | Thomas A. Figura | 2000-11-07 |
| 6140249 | Low dielectric constant dielectric films and process for making the same | — | 2000-10-31 |
| 6137180 | Low cost DRAM metallization | Gurtej S. Sandhu | 2000-10-24 |
| 6112697 | RF powered plasma enhanced chemical vapor deposition reactor and methods | Gurtej S. Sandhu, Paul Smith | 2000-09-05 |
| 6110820 | Low scratch density chemical mechanical planarization process | Gurtej S. Sandhu | 2000-08-29 |
| 6093968 | Germanium alloy contact to a silicon substrate | Jeffrey W. Honeycutt | 2000-07-25 |
| 6090707 | Method of forming a conductive silicide layer on a silicon comprising substrate and method of forming a conductive silicide contact | Gurtej S. Sandhu, Terry L. Gilton | 2000-07-18 |
| 6090708 | Method of forming a crystalline phase material, electrically conductive line and refractory metal silicide | Gurtej S. Sandhu, Chris Hill | 2000-07-18 |
| 6086442 | Method of forming field emission devices | Gurtej S. Sandhu | 2000-07-11 |
| 6085689 | Apparatus to increase gas residence time in a reactor | Gurtej S. Sandhu, Ravi Iyer | 2000-07-11 |
| 6083358 | Multiple species sputtering for improved bottom coverage and improved sputter rate | P. J. Ireland, Howard E. Rhodes, Sukesh Sandhu, Tim O'Brien, Tim Johnson | 2000-07-04 |
| 6077754 | Methods of forming a silicon nitride film, a capacitor dielectric layer and a capacitor | Anand Srinivasan, Gurtej S. Sandhu | 2000-06-20 |
| 6067680 | Semiconductor processing method of forming a conductively doped semiconductive material plug within a contact opening | Pai-Hung Pan, Kirk D. Prall | 2000-05-30 |
| 6063700 | Method of forming ohmic conductive components in a single chamber process | Gurtej S. Sandhu | 2000-05-16 |
| 6057200 | Method of making a field effect transistor having an elevated source and an elevated drain | Kirk D. Prall, Pai-Hung Pan | 2000-05-02 |
| 6054191 | Method of forming an electrical contact to a silicon substrate | Gurtej S. Sandhu | 2000-04-25 |
| 6027970 | Method of increasing capacitance of memory cells incorporating hemispherical grained silicon | Thomas A. Figura, Anand Srinivasan, Gurtej S. Sandhu | 2000-02-22 |
| 5998844 | Semiconductor constructions comprising electrically conductive plugs having monocrystalline and polycrystalline silicon | Kirk D. Prall, Pai-Hung Pan | 1999-12-07 |
| 5997634 | Method of forming a crystalline phase material | Gurtej S. Sandhu | 1999-12-07 |
| 5990021 | Integrated circuit having self-aligned CVD-tungsten/titanium contact plugs strapped with metal interconnect and method of manufacture | Kirk D. Prall, Howard E. Rhodes, Gurtel Sandhu, Philip J. Ireland | 1999-11-23 |
| 5985767 | Facet etch for improved step coverage of integrated circuit contacts | Ceredig Roberts, Anand Srinivasan, Gurtej S. Sandhu | 1999-11-16 |