SS

Sujit Sharan

Micron: 132 patents #93 of 6,345Top 2%
IN Intel: 64 patents #439 of 30,777Top 2%
Applied Materials: 7 patents #1,721 of 7,310Top 25%
📍 Chandler, AZ: #4 of 3,331 inventorsTop 1%
🗺 Arizona: #30 of 32,909 inventorsTop 1%
Overall (All Time): #3,427 of 4,157,543Top 1%
198
Patents All Time

Issued Patents All Time

Showing 101–125 of 198 patents

Patent #TitleCo-InventorsDate
6746952 Diffusion barrier layer for semiconductor wafer fabrication Ammar Derraa, Paul Castrovillo 2004-06-08
6737328 Methods of forming silicon dioxide layers, and methods of forming trench isolation regions Gurtej S. Sandhu 2004-05-18
6727173 Semiconductor processing methods of forming an utilizing antireflective material layers, and methods of forming transistor gate stacks Gurtej S. Sandhu 2004-04-27
6706158 Electrochemical mechanical planarization 2004-03-16
6706116 Method of forming a crystalline phase material Gurtej S. Sandhu 2004-03-16
6705246 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition Gurtej S. Sandhu, Paul Smith, Mei Chang 2004-03-16
6696368 Titanium boronitride layer for high aspect ratio semiconductor devices Ammar Derraa, Paul Castrovillo 2004-02-24
6686288 Integrated circuit having self-aligned CVD-tungsten/titanium contact plugs strapped with metal interconnect and method of manufacture Kirk D. Prall, Howard E. Rhodes, Gurtel Sandhu, Philip J. Ireland 2004-02-03
6653234 Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants Ravi Iyer 2003-11-25
6642620 Integrated circuits having low resistivity contacts and the formation thereof using an in situ plasma doping and clean Gurtej S. Sandhu 2003-11-04
6627465 System and method for detecting flow in a mass flow controller Gurtej S. Sandhu, Neal R. Rueger, Allen Mardian 2003-09-30
6602785 Method of forming a conductive contact on a substrate and method of processing a semiconductor substrate using an ozone treatment Gurtej S. Sandhu, Terry L. Gilton 2003-08-05
6597042 Contact with germanium layer Jeffrey W. Honeycutt 2003-07-22
6554910 Method for treating residues in semiconductor processing chambers Gurtej S. Sandhu 2003-04-29
6533894 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition Gurtej S. Sandhu, Paul Smith, Mei Chang 2003-03-18
6531352 Methods of forming conductive interconnects Gurtej S. Sandhu, Trung T. Doan, Howard E. Rhodes, Philip J. Ireland, Martin C. Roberts 2003-03-11
6524975 Combined gate cap or digit line and spacer deposition using HDP Weimin Li, Gurtej S. Sandhu 2003-02-25
6499425 Quasi-remote plasma processing method and apparatus Gurtej S. Sandhu, Anand Srinivasan 2002-12-31
6488571 Apparatus for enhanced rate chemical mechanical polishing with adjustable selectivity 2002-12-03
6472756 Method of forming titanium silicide and titanium by chemical vapor deposition and resulting apparatus Trung T. Doan, Gurtej S. Sandhu, Kirk D. Prall 2002-10-29
6468925 Plasma enhanced chemical vapor deposition process Philip Campbell, Craig M. Carpenter, Allen Mardian 2002-10-22
6444556 Chemistry for chemical vapor deposition of titanium containing films Howard E. Rhodes, Philip J. Ireland, Gurtej S. Sandhu 2002-09-03
6433430 Contact structure having a diffusion barrier Varatharajan Nagabushnam 2002-08-13
6429071 Method of increasing capacitance of memory cells incorporating hemispherical grained silicon Thomas A. Figura, Anand Srinivasan, Gurtej S. Sandhu 2002-08-06
6423626 Removal of metal cusp for improved contact fill Anand Srinivasan, Gurtej S. Sandhu 2002-07-23