Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6984288 | Plasma processor in plasma confinement region within a vacuum chamber | Rajinder Dhindsa, Mukund Srinivasan, Eric H. Lenz | 2006-01-10 |
| 6833325 | Method for plasma etching performance enhancement | Zhisong Huang | 2004-12-21 |
| 6746961 | Plasma etching of dielectric layer with etch profile control | Tuqiang Ni | 2004-06-08 |
| 6716303 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Tuqiang Ni, Wenli Collison, David Hemker | 2004-04-06 |
| 6527911 | Configurable plasma volume etch chamber | Bi-Ming Yen, Tuqiang Ni, David Hemker | 2003-03-04 |
| 6506685 | Perforated plasma confinement ring in plasma reactors | George Mueller | 2003-01-14 |
| 6178919 | Perforated plasma confinement ring in plasma reactors | George Mueller | 2001-01-30 |
| 6106663 | Semiconductor process chamber electrode | Andras Kuthi | 2000-08-22 |
| 6090304 | Methods for selective plasma etch | Helen Zhu, George Mueller, Thomas D. Nguyen | 2000-07-18 |
| 5716485 | Electrode designs for controlling uniformity profiles in plasma processing reactors | Siamak Salimian, Carol M. Heller | 1998-02-10 |
| 5656123 | Dual-frequency capacitively-coupled plasma reactor for materials processing | Siamak Salimian, Carol M. Heller | 1997-08-12 |