Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11694872 | Pattern enhancement using a gas cluster ion beam | Kazuya Dobashi, Hiromitsu Kambara, Masaru Nishino, Reo Kosaka, Matthew C. Gwinn +3 more | 2023-07-04 |
| 11450506 | Pattern enhancement using a gas cluster ion beam | Kazuya Dobashi, Hiromitsu Kambara, Masaru Nishino, Reo Kosaka, Matthew C. Gwinn +3 more | 2022-09-20 |
| 10256095 | Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system | Soo Doo Chae, Noel Russell, Joshua LaRose, Nicholas Joy, Allen J. Leith +3 more | 2019-04-09 |
| 9324567 | Gas cluster ion beam etching process for etching Si-containing, Ge-containing, and metal-containing materials | Martin D. Tabat, Christopher K. Olsen, Yan Shao, Ruairidh MacCrimmon | 2016-04-26 |
| 9209033 | GCIB etching method for adjusting fin height of finFET devices | Edmund Burke | 2015-12-08 |
| 8728947 | Gas cluster ion beam process for opening conformal layer in a high aspect ratio contact via | Christopher K. Olsen | 2014-05-20 |
| 8722542 | Gas cluster ion beam process for opening conformal layer in a high aspect ratio contact via | Christopher K. Olsen | 2014-05-13 |
| 8183161 | Method and system for dry etching a hafnium containing material | Masafumi Urakawa | 2012-05-22 |