Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12224158 | Plasma processing apparatus | Yoshinori Yoshida, Kazuyuki Hirozane | 2025-02-11 |
| 11915951 | Plasma processing method | Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Tatehito Usui, Naoyuki Kofuji +4 more | 2024-02-27 |
| 11835465 | Detecting method and detecting device of gas components and processing apparatus using detecting device of gas components | Yoshifumi Ogawa, Masaru Izawa | 2023-12-05 |
| 11557463 | Vacuum processing apparatus | Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Kenji Maeda, Satoshi Sakai +1 more | 2023-01-17 |
| 11515167 | Plasma etching method and plasma processing apparatus | Sumiko Fujisaki, Yoshihide Yamaguchi, Hiroyuki Kobayashi, Kazunori Shinoda, Kohei Kawamura +1 more | 2022-11-29 |
| 11276579 | Substrate processing method and plasma processing apparatus | Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Masaru Izawa | 2022-03-15 |
| D924824 | Ion shield plate base for semiconductor manufacturing apparatus | Kazuyuki Hirozane, Michiaki Kobayashi, Yoshifumi Ogawa | 2021-07-13 |
| 10937635 | Vacuum processing apparatus | Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Kenji Maeda, Satoshi Sakai +1 more | 2021-03-02 |
| 10872779 | Plasma etching method and plasma etching apparatus | Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda, Kohei Kawamura, Kazumasa Ookuma +1 more | 2020-12-22 |
| D901407 | Integrated type ion shield for semiconductor manufacturing apparatus | Michiaki Kobayashi, Kazuyuki Hirozane, Nobuya Miyoshi, Kohei Kawamura, Hiroyuki Kobayashi | 2020-11-10 |
| D900760 | Ion shield plate for semiconductor manufacturing apparatus | Michiaki Kobayashi, Kazuyuki Hirozane, Kohei Kawamura, Nobuya Miyoshi, Hiroyuki Kobayashi | 2020-11-03 |
| 10825664 | Wafer processing method and wafer processing apparatus | Tomoyuki Watanabe, Takumi Tandou, Kenetsu Yokogawa, Hiroshi Ito | 2020-11-03 |
| D864885 | Infrared lamp heater transmission window for semiconductor manufacturing apparatus | Michiaki Kobayashi, Kazuyuki Hirozane, Akio Harada, Nobuhide Nunomura | 2019-10-29 |
| 10325781 | Etching method and etching apparatus | Kazunori Shinoda, Satoshi Sakai, Masaru Izawa, Nobuya Miyoshi, Hiroyuki Kobayashi +2 more | 2019-06-18 |
| 10290472 | Vacuum processing apparatus | Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Kenji Maeda, Satoshi Sakai +1 more | 2019-05-14 |
| 10141207 | Operation method of plasma processing apparatus | Hiroyuki Kobayashi, Nobuya Miyoshi, Kenetsu Yokogawa, Tomoyuki Watanabe | 2018-11-27 |
| 8282848 | Plasma processing method and plasma processing apparatus | Yutaka Ohmoto, Mamoru Yakushiji, Ken Yoshioka, Tsunehiko Tsubone | 2012-10-09 |
| 8092637 | Manufacturing method in plasma processing apparatus | Yutaka Ohmoto, Mamoru Yakushiji, Ken Yoshioka, Tsunehiko Tsubone | 2012-01-10 |