Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10825664 | Wafer processing method and wafer processing apparatus | Tomoyuki Watanabe, Yutaka Kouzuma, Kenetsu Yokogawa, Hiroshi Ito | 2020-11-03 |
| 10741368 | Plasma processing apparatus | Takamasa Ichino, Kenetsu Yokogawa | 2020-08-11 |
| 10217613 | Plasma processing apparatus | Tetsuo Kawanabe, Tsutomu Tetsuka, Naoki Yasui | 2019-02-26 |
| 10128141 | Plasma processing apparatus and plasma processing method | Go Miya, Masaru Izawa, Hiromichi Kawasaki | 2018-11-13 |
| 10103007 | Plasma processing apparatus with gas feed and evacuation conduit | Akitaka Makino | 2018-10-16 |
| 9704731 | Plasma processing apparatus and plasma processing method | Go Miya, Masaru Izawa | 2017-07-11 |
| 9368377 | Plasma processing apparatus | Kenetsu Yokogawa, Masaru Izawa | 2016-06-14 |
| 9293300 | Plasma processing apparatus | Hiroyuki Kobayashi, Hideyuki Nagaishi, Naoshi Itabashi | 2016-03-22 |
| 9070724 | Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage | Masaru Izawa | 2015-06-30 |
| 9034270 | Plasma sterilization and cleaning treatment device for escalator, and escalator using the same | Hiroyuki Kobayashi, Naoshi Itabashi | 2015-05-19 |
| 8955579 | Plasma processing apparatus and plasma processing method | Kenetsu Yokogawa, Masaru Izawa | 2015-02-17 |
| 8833089 | Plasma processing apparatus and maintenance method therefor | Masaru Izawa | 2014-09-16 |
| 8747763 | Plasma sterilization apparatus | Nobuyuki Negishi, Hiroyuki Kobayashi, Keizo Suzuki | 2014-06-10 |
| 8426764 | Plasma processing apparatus and plasma processing method | Kenetsu Yokogawa, Masaru Izawa | 2013-04-23 |
| 8349127 | Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage | Masaru Izawa | 2013-01-08 |
| 8034181 | Plasma processing apparatus | Ken'etsu Yokogawa, Masaru Izawa | 2011-10-11 |
| 7838792 | Plasma processing apparatus capable of adjusting temperature of sample stand | Ken'etsu Yokogawa, Seiichiro Kanno, Masaru Izawa | 2010-11-23 |
| 7771564 | Plasma processing apparatus | Ken'etsu Yokogawa, Seiichiro Kanno | 2010-08-10 |