| 10393666 |
Methods, devices, systems, and compositions for detecting gases |
Eugene W. Moretti, Allan Bruce Shang, Steven S. Yauch |
2019-08-27 |
| 9891136 |
Methods to determine a bearing setting |
Douglas K. Brownell, Stacy K. Worley, Kyle K. McKinzie |
2018-02-13 |
| 9539334 |
Orally dissolving thin films containing allergens and methods of making and use |
Hai-Quan Mao, Corinne Keet, Russell Martin |
2017-01-10 |
| 8582107 |
Method and system for detecting the level of anesthesia agent in an anesthesia vaporizer |
Allan Bruce Shang, Eugene W. Moretti |
2013-11-12 |
| 6207787 |
Antireflective coating for microlithography |
James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo +1 more |
2001-03-27 |
| 6153696 |
Process for forming carbonates of hydroxyaromatic compounds |
Gregory Breyta, Daniel J. Dawson, Moahmoud Mostafa Khojasteh, Ranee W. Kwong, Elwood Herbert Macy +5 more |
2000-11-28 |
| 6057080 |
Top antireflective coating film |
William R. Brunsvold, George J. Hefferon, Christopher F. Lyons, Wayne M. Moreau |
2000-05-02 |
| 6051659 |
Highly sensitive positive photoresist composition |
David Paul Merritt, Wayne M. Moreau |
2000-04-18 |
| 5910337 |
Phase-averaging resist coating for reflectivity control |
Christopher F. Lyons, Gary T. Spinillo |
1999-06-08 |
| 5744537 |
Antireflective coating films |
William R. Brunsvold, George J. Hefferon, Christopher F. Lyons, Wayne M. Moreau |
1998-04-28 |
| 5736301 |
Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used |
James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo +1 more |
1998-04-07 |
| 5607824 |
Antireflective coating for microlithography |
James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo +1 more |
1997-03-04 |
| 5554485 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more |
1996-09-10 |
| 5482817 |
Mid and deep-uv antireflection coatings and methods for use thereof |
Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh |
1996-01-09 |
| 5401614 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more |
1995-03-28 |
| 5380621 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh |
1995-01-10 |
| 5273856 |
Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation |
Christopher F. Lyons, Stanley E. Perreault, Gary T. Spinillo |
1993-12-28 |
| 5240812 |
Top coat for acid catalyzed resists |
Willard E. Conley, Ranee W. Kwong, Richard J. Kvitek, Robert N. Lang, Christopher F. Lyons +3 more |
1993-08-31 |
| 4564575 |
Tailoring of novolak and diazoquinone positive resists by acylation of novolak |
Stanley E. Perreault |
1986-01-14 |
| 4473795 |
System for resist defect measurement |
— |
1984-09-25 |
| 4330614 |
Process for forming a patterned resist mask |
William A. Moyer |
1982-05-18 |
