Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8980382 | Oxygen-doping for non-carbon radical-component CVD films | Nitin K. Ingle, Abhijit Basu Mallick, Earl Osman Solis, Olga Lyubimova | 2015-03-17 |
| 7935240 | Electroplating apparatus and method based on an array of anodes | Saravjeet Singh, Manoocher Birang, Aron Rosenfeld | 2011-05-03 |
| 7837851 | In-situ profile measurement in an electroplating process | Manoocher Birang, Bernardo Donoso | 2010-11-23 |
| 7736928 | Precision printing electroplating through plating mask on a solar cell substrate | Sergey Lopatin, John O. Dukovic, David Eaglesham, Robert Z. Bachrach, John D. Busch +1 more | 2010-06-15 |
| 7704352 | High-aspect ratio anode and apparatus for high-speed electroplating on a solar cell substrate | Sergey Lopatin, David Eaglesham, John O. Dukovic, Charles Gay | 2010-04-27 |
| 7670465 | Anolyte for copper plating | Michael Yang | 2010-03-02 |
| 7651934 | Process for electroless copper deposition | Dmitry Lubomirsky, Timothy Weidman, Arulkumar Shanmugasundram, Kapila Wijekoon | 2010-01-26 |
| 7273535 | Insoluble anode with an auxiliary electrode | Dmitry Lubomirsky, Yevgeniy Rabinovich | 2007-09-25 |
| 7247222 | Electrochemical processing cell | Michael Yang, Dmitry Lubomirsky, Yezdi Dordi, Saravjeet Singh, Sheshraj Tulshibagwale | 2007-07-24 |
| 7128823 | Anolyte for copper plating | Michael Yang | 2006-10-31 |
| 7025861 | Contact plating apparatus | Michael Yang, Dmitry Lubomirsky | 2006-04-11 |
| 6878258 | Apparatus and method for removing contaminants from semiconductor copper electroplating baths | — | 2005-04-12 |
| 6852209 | Insoluble electrode for electrochemical operations on substrates | — | 2005-02-08 |
| 6773569 | Potential pulse-scan methods of analyzing organic additives in plating baths with multi-component additives | Zhi-Wen Sun, Chunman Yu, Girish Dixit | 2004-08-10 |
| 6685815 | Electroplating of semiconductor wafers | — | 2004-02-03 |