LL

Leonardus Leunissen

Basf Se: 10 patents #1,659 of 13,826Top 15%
IM Imec: 3 patents #122 of 687Top 20%
SO Sony: 1 patents #17,262 of 25,231Top 70%
Overall (All Time): #364,747 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12351737 Chemical mechanical polishing of substrates containing copper and ruthenium Haci Osman GUEVENC, Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian +1 more 2025-07-08
11993729 Chemical mechanical polishing composition Christian Daeschlein, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more 2024-05-28
11725117 Chemical mechanical polishing of substrates containing copper and ruthenium Haci Osman GUEVENC, Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian +1 more 2023-08-15
11286402 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more 2022-03-29
11264250 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more 2022-03-01
10899945 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more 2021-01-26
10865361 Composition for post chemical-mechanical-polishing cleaning Christian Daeschlein, Max Siebert, Michael Lauter, Ivan Garcia Romero, Haci Osman GUEVENC +3 more 2020-12-15
10844325 Composition for post chemical-mechanical-polishing cleaning Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Julian Proelss +4 more 2020-11-24
10738219 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more 2020-08-11
10385236 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more 2019-08-20
8735182 Method for detecting embedded voids in a semiconductor substrate Sandip Halder, Eric Beyne 2014-05-27
7709160 Method for manufacturing attenuated phase-shift masks and devices obtained therefrom Masaki Yoshizawa 2010-05-04
7695877 Methods and devices for lithography using electromagnetic radiation with short wavelengths Roel Gronheid 2010-04-13