Issued Patents All Time
Showing 25 most recent of 101 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11313034 | Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition | Weimin Zeng, Yong Cao, Daniel Lee Diehl, Huixiong Dai, Christopher S. Ngai +2 more | 2022-04-26 |
| 8028531 | Mitigating heat in an integrated circuit | Bharath Rangarajan, Bhanwar Singh | 2011-10-04 |
| 7709373 | System and method for imprint lithography to facilitate dual damascene integration in a single imprint act | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2010-05-04 |
| 7604903 | Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) | Bhanwar Singh, Srikanteswara Dakshina-Murthy, Bharath Rangarajan, Ramkumar Subramanian | 2009-10-20 |
| 7591902 | Recirculation and reuse of dummy dispensed resist | Bharath Rangarajan, Ramkumar Subramanian, Ursula Q. Quinto, Michael Templeton | 2009-09-22 |
| 7449348 | Feedback control of imprint mask feature profile using scatterometry and spacer etchback | Srikanteswara Dakshina-Murthy, Bhanwar Singh, Ramkumar Subramanian | 2008-11-11 |
| 7381278 | Using supercritical fluids to clean lenses and monitor defects | Ramkumar Subramanian, Bhanwar Singh, Srikanteswara Dakshina-Murthy | 2008-06-03 |
| 7295288 | Systems and methods of imprint lithography with adjustable mask | Ramkumar Subramanian, Bhanwar Singh | 2007-11-13 |
| 7289193 | Frame structure for turbulence control in immersion lithography | Ramkumar Subramanian, Bhanwar Singh | 2007-10-30 |
| 7262422 | Use of supercritical fluid to dry wafer and clean lens in immersion lithography | Ramkumar Subramanian, Bhanwar Singh | 2007-08-28 |
| 7251033 | In-situ reticle contamination detection system at exposure wavelength | Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian | 2007-07-31 |
| 7224456 | In-situ defect monitor and control system for immersion medium in immersion lithography | Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian | 2007-05-29 |
| 7221060 | Composite alignment mark scheme for multi-layers in lithography | Bhanwar Singh, Bharath Rangarajan, Iraj Emami, Ramkumar Subramanian | 2007-05-22 |
| 7187796 | Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication | Ramkumar Subramanian, Bhanwar Singh | 2007-03-06 |
| 7173648 | System and method for visually monitoring a semiconductor processing system | Bharath Rangarajan, Bhanwar Singh, Bryan K. Choo | 2007-02-06 |
| 7159205 | Use of non-lithographic shrink techniques for fabrication/making of imprints masks | Gilles Amblard, Bhanwar Singh | 2007-01-02 |
| 7156925 | Using supercritical fluids to clean lenses and monitor defects | Ramkumar Subramanian, Bhanwar Singh, Srikanteswara Dakshina-Murthy | 2007-01-02 |
| 7158896 | Real time immersion medium control using scatterometry | Bhanwar Singh, Srikanteswara Dakshina-Murthy, Ramkumar Subramanian, Bharath Rangarajan, Iraj Emami | 2007-01-02 |
| 7153364 | Re-circulation and reuse of dummy-dispensed resist | Bharath Rangarajan, Ramkumar Subramanian, Ursula Q. Quinto, Michael K. Templeton | 2006-12-26 |
| 7148142 | System and method for imprint lithography to facilitate dual damascene integration in a single imprint act | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2006-12-12 |
| 7109046 | Surface oxide tabulation and photo process control and cost savings | Ramkumar Subramanian, Bhanwar Singh | 2006-09-19 |
| 7100826 | Barcode marking of wafer products for inventory control | Michael K. Templeton, Bhanwar Singh | 2006-09-05 |
| 7076320 | Scatterometry monitor in cluster process tool environment for advanced process control (APC) | Bhanwar Singh, Ramkumar Subramanian | 2006-07-11 |
| 7069155 | Real time analytical monitor for soft defects on reticle during reticle inspection | Bhanwar Singh, Bharath Rangarajan | 2006-06-27 |
| 7065737 | Multi-layer overlay measurement and correction technique for IC manufacturing | Bharath Rangarajan, Bhanwar Singh | 2006-06-20 |