| 7962459 |
Method of providing context specific recipes in a semiconductor facility by defining product categories |
Ronald Grünz, Heiko Wagner, Uwe Liebold |
2011-06-14 |
| 7256113 |
System for forming a semiconductor device and method thereof |
Phillip E. Crabtree, Massud Aminpur |
2007-08-14 |
| 7151055 |
Technique for forming a gate electrode by using a hard mask |
Massud Aminpur |
2006-12-19 |
| 7130762 |
Method and system for handling substrates in a production line including a cluster tool and a metrology tool |
Peter Goerigk, Uwe Liebold, Ronald Gruenz, Karl-Heinz Fandrey |
2006-10-31 |
| 6979651 |
Method for forming alignment features and back-side contacts with fewer lithography and etch steps |
Douglas J. Bonser, Srikanteswara Dakshina-Murthy |
2005-12-27 |
| 6902870 |
Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer |
Massud Aminpur |
2005-06-07 |
| 6893967 |
L-shaped spacer incorporating or patterned using amorphous carbon or CVD organic materials |
Marilyn I. Wright, Douglas J. Bonser, Lu You |
2005-05-17 |
| 6881616 |
System for forming a semiconductor device and method thereof including implanting through a L shaped spacer to form source and drain regions |
Douglas J. Bonser, Wen-Jie Qi |
2005-04-19 |
| 6828240 |
Method of manufacturing multi-level contacts by sizing of contact sizes in integrated circuits |
Massud Aminpur |
2004-12-07 |
| 6703297 |
Method of removing inorganic gate antireflective coating after spacer formation |
— |
2004-03-09 |
| 6699641 |
Photosensitive bottom anti-reflective coating |
Massud Aminpur |
2004-03-02 |
| 6696334 |
Method for formation of a differential offset spacer |
Srikanteswara Dakshina-Murthy, Christoph Schwan |
2004-02-24 |
| 6673635 |
Method for alignment mark formation for a shallow trench isolation process |
Douglas J. Bonser, Srikanteswara Dakshina-Murthy |
2004-01-06 |
