Issued Patents All Time
Showing 25 most recent of 67 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11249644 | Magnetic tape integration with distributed disk file systems | Slavisa Sarafijanovic, Martin Petermann, Bo Zou, Jin Yin, Feng Shao +1 more | 2022-02-15 |
| 9048180 | Low stress sacrificial cap layer | Periannan Chidambaram, Srinivasan Chakravarthi | 2015-06-02 |
| 8835263 | Formation of a selective carbon-doped epitaxial cap layer on selective epitaxial SiGe | Johan W. Weijtmans, Rick L. Wise | 2014-09-16 |
| 8546259 | Nickel silicide formation for semiconductor components | Juanita DeLoach, Haowen Bu | 2013-10-01 |
| 8088659 | Method of forming capacitors | Ming-Jang Hwang | 2012-01-03 |
| 8053296 | Capacitor formed on a recrystallized polysilicon layer | Haowen Bu, Clint Montgomery | 2011-11-08 |
| 7994073 | Low stress sacrificial cap layer | Periannan Chidambaram, Srinivasan Chakravarthi | 2011-08-09 |
| 7943499 | FUSI integration method using SOG as a sacrificial planarization layer | Yaw S. Obeng, Ping Jiang, Joe G. Tran | 2011-05-17 |
| 7732313 | FUSI integration method using SOG as a sacrificial planarization layer | Yaw S. Obeng, Ping Jiang, Joe G. Tran | 2010-06-08 |
| 7732852 | High-K dielectric materials and processes for manufacturing them | Ming-Jang Hwang | 2010-06-08 |
| 7732312 | FUSI integration method using SOG as a sacrificial planarization layer | Yaw S. Obeng, Ping Jiang, Joe G. Tran | 2010-06-08 |
| 7666729 | Method for improving the thermal stability of silicide | Jiejie Xu | 2010-02-23 |
| 7655555 | In-situ co-deposition of Si in diffusion barrier material depositions with improved wettability, barrier efficiency, and device reliability | Richard Allen Faust, Qing Jiang | 2010-02-02 |
| 7585738 | Method of forming a fully silicided semiconductor device with independent gate and source/drain doping and related device | Shaofeng Yu, Freidoon Mehrad | 2009-09-08 |
| 7544987 | High-k dielectric materials and processes for manufacturing them | Ming-Jang Hwang | 2009-06-09 |
| 7448395 | Process method to facilitate silicidation | Freidoon Mehrad, Lindsey Hall, Vivian Liu, Clint Montgomery, Scott Francis Johnson | 2008-11-11 |
| 7422967 | Method for manufacturing a semiconductor device containing metal silicide regions | Juanita DeLoach, Lindsey Hall, Lance Robertson, Donald Miles | 2008-09-09 |
| 7422968 | Method for manufacturing a semiconductor device having silicided regions | Clint Montgomery, Lindsey Hall, Donald Miles, Duofeng Yue, Thomas D. Bonifiield | 2008-09-09 |
| 7348265 | Semiconductor device having a silicided gate electrode and method of manufacture therefor | — | 2008-03-25 |
| 7341933 | Method for manufacturing a silicided gate electrode using a buffer layer | Shaofeng Yu, Haowen Bu, Lindsey Hall | 2008-03-11 |
| 7338888 | Method for manufacturing a semiconductor device having a silicided gate electrode and a method for manufacturing an integrated circuit including the same | Haowen Bu, Shaofeng Yu, Ping Jiang | 2008-03-04 |
| 7335595 | Silicide formation using a low temperature anneal process | Lance Robertson, Donald Miles | 2008-02-26 |
| 7253049 | Method for fabricating dual work function metal gates | Shaofeng Yu, Haowen Bu, Lindsey Hall, Mark Visokay | 2007-08-07 |
| 7253124 | Process for defect reduction in electrochemical plating | Patricia B. Smith | 2007-08-07 |
| 7208409 | Integrated circuit metal silicide method | Duofeng Yue, Xiaozhan Liu, Donald Miles, Lance Robertson | 2007-04-24 |