| 10559483 |
Platform architecture to improve system productivity |
Richard H. Gould, Candi Kristoffersen, Gustavo G. Francken, Benjamin W. Mooring |
2020-02-11 |
| 7407565 |
Method and apparatus for ionized plasma deposition |
Wei Wang |
2008-08-05 |
| 7097744 |
Method and apparatus for controlling darkspace gap in a chamber |
Alan Liu, Marc Schweitzer, Michael Rosenstein, Jennifer Watia, Xinyu Zhang +3 more |
2006-08-29 |
| 6627056 |
Method and apparatus for ionized plasma deposition |
Wei Wang |
2003-09-30 |
| 6579426 |
Use of variable impedance to control coil sputter distribution |
John C. Forster |
2003-06-17 |
| 6228236 |
Sputter magnetron having two rotation diameters |
Michael Rosenstein, Jianming Fu, Leif DeLaurentis, Alan Liu |
2001-05-08 |
| 6228235 |
Magnetron for low pressure, full face erosion |
Avi Tepman |
2001-05-08 |
| 6193811 |
Method for improved chamber bake-out and cool-down |
Arvind Sundarrajan, Dinesh Saigal, Peijun Ding |
2001-02-27 |
| 6059945 |
Sputter target for eliminating redeposition on the target sidewall |
Jianming Fu |
2000-05-09 |
| 6023038 |
Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system |
— |
2000-02-08 |
| 5922133 |
Multiple edge deposition exclusion rings |
Avi Tepman |
1999-07-13 |
| 5914018 |
Sputter target for eliminating redeposition on the target sidewall |
Jianming Fu |
1999-06-22 |
| 5658442 |
Target and dark space shield for a physical vapor deposition system |
Fernand Dorleans, Christopher Hagerty, Mark Cassidy Cridlin Lloyd, Howard H. Tang, Siyaun Yang +1 more |
1997-08-19 |
| 5650052 |
Variable cell size collimator |
Sergio Edelstein, Nitin Khurana, Keiji Miyamoto, Roderick C. Mosely, William J. Murphy +2 more |
1997-07-22 |
| 5516403 |
Reversing orientation of sputtering screen to avoid contamination |
John C. Forster, Avi Tepman |
1996-05-14 |
