Issued Patents All Time
Showing 25 most recent of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11226561 | Self-priming resist for generic inorganic hardmasks | Chi-Chun Liu, Indira Seshadri, Kristin Schmidt, Nelson Felix, Daniel P. Sanders +2 more | 2022-01-18 |
| 10915023 | Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers | Shu-Jen Han, Brian Lin, Hareem T. Maune, Charles Thomas Rettner, Linda Karin Sundberg +1 more | 2021-02-09 |
| 9983475 | Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators | Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Rudy J. Wojtecki | 2018-05-29 |
| 9951164 | Non-ionic aryl ketone based polymeric photo-acid generators | Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Rudy J. Wojtecki | 2018-04-24 |
| 9950999 | Non-ionic low diffusing photo-acid generators | Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Rudy J. Wojtecki | 2018-04-24 |
| 9879152 | Block copolymers for directed self-assembly applications | Noel Arellano, Joy Cheng, Teddie Peregrino Magbitang, Jed W. Pitera, Daniel P. Sanders +2 more | 2018-01-30 |
| 9851639 | Photoacid generating polymers containing a urethane linkage for lithography | Robert David Allen, Phillip Brock, Masaki Fujiwara, Kazuhiko Maeda | 2017-12-26 |
| 9671694 | Wet strippable gap fill materials | Martin Glodde, Ratnam Sooriyakumaran, Seiichiro Tachibana | 2017-06-06 |
| 9389516 | Resist performance for the negative tone develop organic development process | Luisa D. Bozano, Dario L. Goldfarb, Linda Karin Sundberg, HsinYu Tsai, Gregory M. Walraff | 2016-07-12 |
| 9244345 | Non-ionic photo-acid generating polymers for resist applications | Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Rudy J. Wojtecki +1 more | 2016-01-26 |
| 9057951 | Chemically amplified photoresist composition and process for its use | Robert David Allen, Phillip Brock, Richard Anthony DiPietro | 2015-06-16 |
| 9057960 | Resist performance for the negative tone develop organic development process | Luisa D. Bozano, Dario L. Goldfarb, Linda Karin Sundberg, HsinYu Tsai, Gregory Michael Wallraff | 2015-06-16 |
| 8945808 | Self-topcoating resist for photolithography | Robert Allen David, Phillip Brock, Carl E. Larson, Daniel P. Sanders, Ratnam Sooriyakumaran +2 more | 2015-02-03 |
| 8900802 | Positive tone organic solvent developed chemically amplified resist | Robert David Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda Karin Sundberg +2 more | 2014-12-02 |
| 8821978 | Methods of directed self-assembly and layered structures formed therefrom | Joy Cheng, William D. Hinsberg, Hiroshi Ito, Ho-Cheol Kim, Young-Hye Na +3 more | 2014-09-02 |
| 8802347 | Silicon containing coating compositions and methods of use | Robert David Allen, Phillip Brock, Kuang-Jung Chen, Alexander Friz, Wu-Song Huang +2 more | 2014-08-12 |
| 8334088 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran | 2012-12-18 |
| 8323868 | Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof | Joy Cheng, Ho-Cheol Kim, Hiroshi Ito | 2012-12-04 |
| 8168366 | Low activation energy photoresist composition and process for its use | Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran | 2012-05-01 |
| 8124327 | Method for using compositions containing fluorocarbinols in lithographic processes | Gregory Breyta, Daniel P. Sanders | 2012-02-28 |
| 8034532 | High contact angle topcoat material and use thereof in lithography process | Robert David Allen, Phillip Brock, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg | 2011-10-11 |
| 7951525 | Low outgassing photoresist compositions | Richard Anthony DiPietro, Ratnam Sooriyakumaran, Sally A. Swanson | 2011-05-31 |
| 7883828 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran | 2011-02-08 |
| 7824845 | Functionalized carbosilane polymers and photoresist compositions containing the same | Robert David Allen, Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran | 2010-11-02 |
| 7820369 | Method for patterning a low activation energy photoresist | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran +1 more | 2010-10-26 |