Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9390995 | Semiconductor device and method of manufacturing the same | Kei Yamamoto, Kazuhiro Tada, Toru Kimura, Masaki Goto, Hiroyuki Yoshihara | 2016-07-12 |
| 7759745 | Semiconductor memory device | Hisayuki Shimada, Yu Sun, Hiroyuki Kinoshita | 2010-07-20 |
| 7482226 | Semiconductor memory device | Hisayuki Shimada, Yu Sun, Hiroyuki Kinoshita | 2009-01-27 |
| 7227780 | Semiconductor device and control method thereof | Shouichi Kawamura, Masanori Taya | 2007-06-05 |
| 7202540 | Semiconductor memory device | Hisayuki Shimada, Yu Sun, Hiroyuki Kinoshita | 2007-04-10 |
| 6713809 | Dual bit memory device with isolated polysilicon floating gates | Jusuke Ogura, Kazuhiro Kurihara, Masaru Yano, Tuan Pham, Angela T. Hui | 2004-03-30 |
| 6579769 | Semiconductor device manufacturing method including forming FOX with dual oxidation | Hiroyuki Shimada, Masaaki Higashitani, Hideo Kurihara, Satoshi Takahashi | 2003-06-17 |
| 6573140 | Process for making a dual bit memory device with isolated polysilicon floating gates | Jusuke Ogura, Kiyoshi Izumi, Masaru Yano, Tuan Pham, Angela T. Hui | 2003-06-03 |
| 6528390 | Process for fabricating a non-volatile memory device | David K. Foote, Fei Wang, Bharath Rangarajan | 2003-03-04 |
| 6265268 | High temperature oxide deposition process for fabricating an ONO floating-gate electrode in a two bit EEPROM device | Arvind Halliyal, Robert B. Ogle, Kenneth Wo-Wai Au | 2001-07-24 |
| 6248628 | Method of fabricating an ONO dielectric by nitridation for MNOS memory cells | Arvind Halliyal, David K. Foote, Kenneth Wo-Wai Au | 2001-06-19 |
| 6248635 | Process for fabricating a bit-line in a monos device using a dual layer hard mask | David K. Foote, Bharath Rangarajan, Steven K. Park | 2001-06-19 |
| 6242305 | Process for fabricating a bit-line using buried diffusion isolation | David K. Foote, Bharath Rangarajan, Fei Wang | 2001-06-05 |
| 6218227 | Method to generate a MONOS type flash cell using polycrystalline silicon as an ONO top layer | Steven K. Park, Arvind Halliyal | 2001-04-17 |
| 6187640 | Semiconductor device manufacturing method including various oxidation steps with different concentration of chlorine to form a field oxide | Hiroyuki Shimada, Masaaki Higashitani, Hideo Kurihara, Satoshi Takahashi | 2001-02-13 |
| 6117730 | Integrated method by using high temperature oxide for top oxide and periphery gate oxide | Kenneth Wo-Wai Au, Mark Ramsbey | 2000-09-12 |
| 5976260 | Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus | Yoshimi Kinoshita, Tomoyuki Kanda, Katsuhisa Kitano, Kazuo Yoshida, Hiroshi Ohnishi +9 more | 1999-11-02 |
| 5950086 | Method of fabricating an EPROM type device with reduced process residues | Satoshi Takahashi, Tatsuya Kajita, Hideo Kurihara, Masaaki Higashitani | 1999-09-07 |
| 5770304 | Wide bandwidth electromagnetic wave absorbing material | Koji Nakamura, Mitsuyuki Oda, Kazunori Kanda | 1998-06-23 |
| 5534073 | Semiconductor producing apparatus comprising wafer vacuum chucking device | Yoshimi Kinoshita, Tomoyuki Kanda, Katsuhisa Kitano, Kazuo Yoshida, Hiroshi Ohnishi +9 more | 1996-07-09 |