Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11682560 | Systems and methods for hafnium-containing film removal | Zhenjiang Cui, Daniella Holm | 2023-06-20 |
| 11637002 | Methods and systems to enhance process uniformity | Saravjeet Singh, Alan Tso, Jingchun Zhang, Zihui Li, Dmitry Lubomirsky | 2023-04-25 |
| 11328909 | Chamber conditioning and removal processes | Zhenjiang Cui, Nitin K. Ingle | 2022-05-10 |
| 11239061 | Methods and systems to enhance process uniformity | Saravjeet Singh, Alan Tso, Jingchun Zhang, Zihui Li, Dmitry Lubomirsky | 2022-02-01 |
| 11121002 | Systems and methods for etching metals and metal derivatives | Zhenjiang Cui, Siliang Chang, Daniella Holm | 2021-09-14 |
| 10861676 | Metal recess for semiconductor structures | Zhenjiang Cui, Nitin K. Ingle, Feiyue Ma, Siliang Chang, Daniella Holm | 2020-12-08 |
| 10854426 | Metal recess for semiconductor structures | Zhenjiang Cui, Nitin K. Ingle, Feiyue Ma, Siliang Chang, Daniella Holm | 2020-12-01 |
| 10692880 | 3D NAND high aspect ratio structure etch | Zhenjiang Cui, Anchuan Wang, Zhijun Chen, Nitin K. Ingle | 2020-06-23 |
| 9960049 | Two-step fluorine radical etch of hafnium oxide | Jie Liu, Zhenjiang Cui | 2018-05-01 |
| 9881805 | Silicon selective removal | Zihui Li, Ching-Mei Hsu, Jingchun Zhang | 2018-01-30 |
| 9564338 | Silicon-selective removal | Jingchun Zhang | 2017-02-07 |
| 9472412 | Procedure for etch rate consistency | Jingchun Zhang | 2016-10-18 |
| 9245762 | Procedure for etch rate consistency | Jingchun Zhang | 2016-01-26 |