Issued Patents All Time
Showing 25 most recent of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12140245 | Electric field device | Sven Rausch, Nikolai Schulz | 2024-11-12 |
| 8615314 | Process control using analysis of an upstream process | Thomas J. Sonderman, Alexander J. Pasadyn | 2013-12-24 |
| 8321048 | Associating data with workpieces and correlating the data with yield data | Elfido Coss, Jr., Anastasia Oshelski Peterson | 2012-11-27 |
| 8185230 | Method and apparatus for predicting device electrical parameters during fabrication | Michael L. Miller | 2012-05-22 |
| 7797073 | Controlling processing of semiconductor wafers based upon end of line parameters | Alexander J. Pasadyn | 2010-09-14 |
| 7558687 | Method and apparatus for dynamic adjustment of a sensor sampling rate | — | 2009-07-07 |
| 7519447 | Method and apparatus for integrating multiple sample plans | Kevin R. Lensing | 2009-04-14 |
| 7502702 | Method and apparatus for dynamic adjustment of sensor and/or metrology sensitivities | Richard J. Markle, Kevin R. Lensing | 2009-03-10 |
| 7445945 | Method and apparatus for dynamic adjustment of a sampling plan based on wafer electrical test data | Richard J. Markle | 2008-11-04 |
| 7424392 | Applying a self-adaptive filter to a drifting process | Jin Wang, Robert J. Chong, Si QIN, Alexander J. Pasadyn | 2008-09-09 |
| 7299154 | Method and apparatus for fast disturbance detection and classification | Qinghua He, Jin Wang | 2007-11-20 |
| 7200459 | Method for determining optimal photolithography overlay targets based on process performance and yield in microelectronic fabrication | Anthony J. Toprac | 2007-04-03 |
| 7120514 | Method and apparatus for performing field-to-field compensation | Joyce S. Oey Hewett | 2006-10-10 |
| 7103439 | Method and apparatus for initializing tool controllers based on tool event data | Alexander J. Pasadyn, Anthony J. Toprac, Joyce S. Oey Hewett, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2006-09-05 |
| 7069103 | Controlling cumulative wafer effects | Matthew A. Purdy | 2006-06-27 |
| 7020535 | Method and apparatus for providing excitation for a process controller | J. Broc Stirton, Robert J. Chong | 2006-03-28 |
| 6978189 | Matching data related to multiple metrology tools | Matthew A. Purdy, Alexander J. Pasadyn | 2005-12-20 |
| 6970757 | Method and apparatus for updating control state variables of a process control model based on rework data | Joyce S. Oey Hewett, Anthony J. Toprac, Alexander J. Pasadyn, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2005-11-29 |
| 6957120 | Multi-level process data representation | Michael L. Miller | 2005-10-18 |
| 6947803 | Dispatch and/or disposition of material based upon an expected parameter result | Alexander J. Pasadyn | 2005-09-20 |
| 6937914 | Method and apparatus for controlling process target values based on manufacturing metrics | Thomas J. Sonderman, Alexander J. Pasadyn, Anthony J. Toprac, Joyce S. Oey Hewett, Anastasia Oshelski Peterson +1 more | 2005-08-30 |
| 6912436 | Prioritizing an application of correction in a multi-input control system | Gary Jones, Richard D. Edwards, Matthew A. Purdy | 2005-06-28 |
| 6901340 | Method and apparatus for distinguishing between sources of process variation | Alexander J. Pasadyn, Joyce S. Oey Hewett, Anthony J. Toprac, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2005-05-31 |
| 6897075 | Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information | Alexander J. Pasadyn | 2005-05-24 |
| 6871114 | Updating process controller based upon fault detection analysis | Eric O. Green, Matthew A. Purdy, Elfido Coss, Jr., Robert J. Chong, Gregory A. Cherry | 2005-03-22 |