Issued Patents All Time
Showing 25 most recent of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12362149 | Film stress control for plasma enhanced chemical vapor deposition | Chien-Teh Kao, Tae Kyung Won, Sanjay Yadav, Young Dong LEE, Shinichi Kurita +1 more | 2025-07-15 |
| 12312689 | Large-area high-density plasma processing chamber for flat panel displays | Suhail Anwar, Yui Lun WU, Jozef Kudela, Jeevan Prakash SEQUEIRA | 2025-05-27 |
| 11854771 | Film stress control for plasma enhanced chemical vapor deposition | Chien-Teh Kao, Tae Kyung Won, Sanjay Yadav, Young Dong LEE, Shinichi Kurita +1 more | 2023-12-26 |
| 11532418 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Jozef Kudela, John M. White | 2022-12-20 |
| 11094508 | Film stress control for plasma enhanced chemical vapor deposition | Chien-Teh Kao, Tae Kyung Won, Sanjay Yadav, Young Dong LEE, Shinichi Kurita +1 more | 2021-08-17 |
| 10903048 | Substrate processing method and apparatus for controlling phase angles of harmonic signals | Yui Lun WU, Jozef Kudela, Suhail Anwar | 2021-01-26 |
| 10886053 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Jozef Kudela, John M. White | 2021-01-05 |
| 10312475 | CVD thin film stress control method for display application | Tae Kyung Won, Soo Young Choi, Sanjay Yadav, Chien-Teh Kao, Suhail Anwar +1 more | 2019-06-04 |
| 10304607 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Jozef Kudela, John M. White | 2019-05-28 |
| 9818580 | Transmission line RF applicator for plasma chamber | Jozef Kudela, Tsutomu Tanaka, Suhail Anwar, John M. White, Ranjit Indrajit Shinde +2 more | 2017-11-14 |
| 9761365 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Jozef Kudela, John M. White | 2017-09-12 |
| 9425026 | Systems and methods for improved radio frequency matching networks | Suhail Anwar, Jozef Kudela | 2016-08-23 |
| 9397380 | Guided wave applicator with non-gaseous dielectric for plasma chamber | Jozef Kudela, Tsutomu Tanaka, Suhail Anwar, John M. White | 2016-07-19 |
| 9382621 | Ground return for plasma processes | Soo Young Choi, Robin L. Tiner, Shinichi Kurita, John M. White, Jeffrey A. Kho +3 more | 2016-07-05 |
| 9048518 | Transmission line RF applicator for plasma chamber | Jozef Kudela, Tsutomu Tanaka, Suhail Anwar, John M. White, Ranjit Indrajit Shinde +2 more | 2015-06-02 |
| 8992723 | RF bus and RF return bus for plasma chamber electrode | Jozef Kudela, Robin L. Tiner, Suhail Anwar, John M. White | 2015-03-31 |
| 8872428 | Plasma source with vertical gradient | Jozef Kudela, Tsutomu Tanaka, Suhail Anwar, John M. White | 2014-10-28 |
| 8853098 | Substrate support with gas introduction openings | Sam Kim, John M. White, Soo Young Choi, Robin L. Tiner, Beom Soo Park | 2014-10-07 |
| 8728586 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Jozef Kudela, John M. White | 2014-05-20 |
| 8691047 | Large area plasma processing chamber with at-electrode RF matching | John M. White, Jozef Kudela | 2014-04-08 |
| 8365682 | Methods and apparatus for supporting substrates | Wendell T. Blonigan, John M. White, Robin L. Tiner | 2013-02-05 |
| 8343592 | Asymmetrical RF drive for electrode of plasma chamber | Jozef Kudela, Soo Young Choi, John M. White | 2013-01-01 |
| 8163191 | Apparatus and methods for using high frequency chokes in a substrate deposition apparatus | — | 2012-04-24 |
| 8147614 | Multi-gas flow diffuser | John M. White, Robin L. Tiner, Beom Soo Park, Soo Young Choi | 2012-04-03 |
| 8075734 | Remote inductively coupled plasma source for CVD chamber cleaning | Jozef Kudela | 2011-12-13 |