| 7080330 |
Concurrent measurement of critical dimension and overlay in semiconductor manufacturing |
Bryan K. Choo, Bharath Rangarajan, Bhanwar Singh |
2006-07-18 |
| 6597463 |
System to determine suitability of sion arc surface for DUV resist patterning |
Bhanwar Singh, Cristina Cheung, Jay Bhakta, Junwei Bao |
2003-07-22 |
| 6594024 |
Monitor CMP process using scatterometry |
Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan |
2003-07-15 |
| 6515342 |
Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion |
Subhash Gupta, Bhanwar Singh |
2003-02-04 |
| 6501534 |
Automated periodic focus and exposure calibration of a lithography stepper |
Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan |
2002-12-31 |
| 6479817 |
Cantilever assembly and scanning tip therefor with associated optical sensor |
Sanjay K. Yedur, Bhanwar Singh, Bryan K. Choo |
2002-11-12 |
| 6459945 |
System and method for facilitating determining suitable material layer thickness in a semiconductor device fabrication process |
Bhanwar Singh, Bharath Rangarajan |
2002-10-01 |
| 6452161 |
Scanning probe microscope having optical fiber spaced from point of hp |
Sanjay K. Yedur, Bhanwar Singh, Bryan K. Choo |
2002-09-17 |
| 6429141 |
Method of manufacturing a semiconductor device with improved line width accuracy |
Minh Van Ngo, Bhanwar Singh, Dawn Hopper |
2002-08-06 |
| 6383947 |
Anti-reflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies |
Paul R. Besser, Bhanwar Singh, Darrell M. Erb, Susan H. Chen |
2002-05-07 |
| 6165855 |
Antireflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies |
Paul R. Besser, Bhanwar Singh, Darrell M. Erb, Susan H. Chen |
2000-12-26 |
| 6093973 |
Hard mask for metal patterning |
Minh Van Ngo, Bhanwar Singh, Dawn Hopper |
2000-07-25 |
| 6066578 |
Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion |
Subhash Gupta, Bhanwar Singh |
2000-05-23 |
| 6063531 |
Focus monitor structure and method for lithography process |
Bhanwar Singh, Bharath Rangarajan, Khoi A. Phan |
2000-05-16 |