Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7657864 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Hung-Eil Kim +1 more | 2010-02-02 |
| 7543256 | System and method for designing an integrated circuit device | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Hung-Eil Kim, Christopher A. Spence +1 more | 2009-06-02 |
| 7422829 | Optical proximity correction (OPC) technique to compensate for flare | Jongwook Kye | 2008-09-09 |
| 7313769 | Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Hung-Eil Kim, Christopher A. Spence +1 more | 2007-12-25 |
| 7281222 | System and method for automatic generation of optical proximity correction (OPC) rule sets | — | 2007-10-09 |
| 7269804 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Hung-Eil Kim +1 more | 2007-09-11 |
| 7207017 | Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results | Cyrus E. Tabery, Chris Haidinyak, Todd P. Lukanc, Luigi Capodieci, Hung-Eil Kim +1 more | 2007-04-17 |
| 7194725 | System and method for design rule creation and selection | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Hung-Eil Kim, Christopher A. Spence +1 more | 2007-03-20 |
| 7125652 | Immersion lithographic process using a conforming immersion medium | Christopher F. Lyons, Jongwook Kye | 2006-10-24 |
| 7080349 | Method of developing optimized optical proximity correction (OPC) fragmentation script for photolithographic processing | Luigi Capodieci | 2006-07-18 |
| 7061075 | Shallow trench isolation using antireflection layer | Jayendra D. Bhakta | 2006-06-13 |
| 6906777 | Pellicle for a lithographic lens | Jongwook Kye, Christopher F. Lyons | 2005-06-14 |
| 6902851 | Method for using phase-shifting mask | Kouros Ghandehari | 2005-06-07 |
| 6821883 | Shallow trench isolation using antireflection layer | Jayendra D. Bhakta | 2004-11-23 |
| 6682988 | Growth of photoresist layer in photolithographic process | — | 2004-01-27 |
| 6660459 | System and method for developing a photoresist layer with reduced pattern collapse | — | 2003-12-09 |
| 6645868 | Method of forming shallow trench isolation using antireflection layer | Jayendra D. Bhakta | 2003-11-11 |
| 6630404 | Reducing feature dimension using self-assembled monolayer | — | 2003-10-07 |
| 6576536 | Ultra narrow lines for field effect transistors | — | 2003-06-10 |
| 6544699 | Method to improve accuracy of model-based optical proximity correction | Hung-Eil Kim | 2003-04-08 |
| 6500587 | Binary and attenuating phase-shifting masks for multiple wavelengths | Kouros Ghandehari, Bhanwar Singh | 2002-12-31 |
| 6475811 | System for and method of using bacteria to aid in contact hole printing | — | 2002-11-05 |
| 6423555 | System for determining overlay error | — | 2002-07-23 |
| 6358843 | Method of making ultra small vias for integrated circuits | Bhanwar Singh | 2002-03-19 |
| 6335235 | Simplified method of patterning field dielectric regions in a semiconductor device | Jayendra D. Bhakta | 2002-01-01 |