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Dynamic text message processing implementing endpoint communication channel selection |
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2025-06-17 |
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Collection, processing, and output of flight information method, system, and apparatus |
Mahdi Al-Husseini, Joshua Barnett, Joseph Divyan Thomas |
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Control moment gyroscope hoist stabilization system, method, and apparatus |
Mahdi Al-Husseini, Joshua Barnett, Derek Sikora |
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Apparatus and method for determining parameters of process operation |
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2023-08-15 |
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Dynamic text message processing implementing endpoint communication channel selection |
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2023-04-04 |
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Device for stabilizing a hoisted object |
Mahdi Al-Husseini, Joshua Barnett |
2022-12-27 |
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Method and system for supply chain management |
Sean Linehan, Andrew Coyle |
2021-08-03 |
| 8859432 |
Bare aluminum baffles for resist stripping chambers |
Fred Dennis Egley, Michael Kang, Jack Kuo, Hong Shih, Duane Outka +1 more |
2014-10-14 |
| 8313635 |
Bare aluminum baffles for resist stripping chambers |
Fred Dennis Egley, Michael Kang, Jack Kuo, Hong Shih, Duane Outka +1 more |
2012-11-20 |
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Bare aluminum baffles for resist stripping chambers |
Fred Dennis Egley, Michael Kang, Jack Kuo, Hong Shih, Duane Outka +1 more |
2010-10-12 |
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Method and apparatus for tuning a set of plasma processing steps |
Vahid Vahedi, John Daugherty, Harmeet Singh |
2009-08-25 |
| 7138067 |
Methods and apparatus for tuning a set of plasma processing steps |
Vahid Vahedi, John Daugherty, Harmeet Singh |
2006-11-21 |
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Method and apparatus for controlling darkspace gap in a chamber |
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2006-08-29 |
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H2O vapor as a processing gas for crust, resist, and residue removal for post ion implant resist strip |
Gladys So-Wan Lo |
2004-08-17 |
| 6770214 |
Method of reducing aluminum fluoride deposits in plasma etch reactor |
Duane Outka, Yousun Kim, John Daugherty |
2004-08-03 |
| 6711621 |
System and method of implementing netware core protocol within a sockets model |
Shital Mitra |
2004-03-23 |
| 6344151 |
Gas purge protection of sensors and windows in a gas phase processing reactor |
John Holland |
2002-02-05 |
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High sputter, etch resistant window for plasma processing chambers |
Arthur M. Howald, Alan M. Schoepp |
2000-06-13 |
| 6071375 |
Gas purge protection of sensors and windows in a gas phase processing reactor |
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2000-06-06 |