Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12400913 | Contact over active gate structures with conductive trench contact taps for advanced integrated circuit structure fabrication | Manish Chandhok, Elijah V. Karpov, Mohit K. HARAN, Charles H. Wallace, Gurpreet Singh +5 more | 2025-08-26 |
| 12369392 | Fabrication of gate-all-around integrated circuit structures having pre-spacer deposition cut gates | Leonard P. GULER, Michael K. Harper, William Hsu, Biswajeet Guha, Tahir Ghani +6 more | 2025-07-22 |
| 12154855 | Self-aligned patterning with colored blocking and structures resulting therefrom | Mohit K. HARAN, Richard E. Schenker, Charles H. Wallace | 2024-11-26 |
| 12080639 | Contact over active gate structures with metal oxide layers to inhibit shorting | Rami Hourani, Manish Chandhok, Richard E. Schenker, Florian Gstrein, Leonard P. GULER +4 more | 2024-09-03 |
| 11990472 | Fabrication of gate-all-around integrated circuit structures having pre-spacer deposition cut gates | Leonard P. GULER, Michael K. Harper, William Hsu, Biswajeet Guha, Tahir Ghani +6 more | 2024-05-21 |
| 11972979 | 1D vertical edge blocking (VEB) via and plug | Leonard P. GULER, Michael K. Harper, Suzanne S. Rich, Charles H. Wallace, Curtis W. Ward +4 more | 2024-04-30 |
| 11721580 | 1D vertical edge blocking (VEB) via and plug | Leonard P. GULER, Michael K. Harper, Suzanne S. Rich, Charles H. Wallace, Curtis W. Ward +4 more | 2023-08-08 |
| 11652045 | Via contact patterning method to increase edge placement error margin | Mohit K. HARAN, Daniel James Bahr, Deepak S. Rao, Marvin Young Paik, Seungdo An +6 more | 2023-05-16 |
| 11211324 | Via contact patterning method to increase edge placement error margin | Mohit K. HARAN, Daniel James Bahr, Deepak S. Rao, Marvin Young Paik, Seungdo An +6 more | 2021-12-28 |
| 11145541 | Conductive via and metal line end fabrication and structures resulting therefrom | Charles H. Wallace, Hyunsoo Park, Mohit K. HARAN, Debashish Basu, Curtis W. Ward +1 more | 2021-10-12 |
| 10038213 | Group IV metal or semiconductor nanowire fabric | Brian A. Korgel, Damon A. Smith, Vincent Holmberg, Paul Thurk | 2018-07-31 |