| 12369392 |
Fabrication of gate-all-around integrated circuit structures having pre-spacer deposition cut gates |
Leonard P. GULER, William Hsu, Biswajeet Guha, Tahir Ghani, Niels Zussblatt +6 more |
2025-07-22 |
| 12068314 |
Fabrication of gate-all-around integrated circuit structures having adjacent island structures |
Leonard P. GULER, William Hsu, Biswajeet Guha, Martin Weiss, Apratim Dhar +7 more |
2024-08-20 |
| 12046652 |
Plug and recess process for dual metal gate on stacked nanoribbon devices |
Nicole K. Thomas, Leonard P. GULER, Marko Radosavljevic, Thoe Michaelos |
2024-07-23 |
| 11990472 |
Fabrication of gate-all-around integrated circuit structures having pre-spacer deposition cut gates |
Leonard P. GULER, William Hsu, Biswajeet Guha, Tahir Ghani, Niels Zussblatt +6 more |
2024-05-21 |
| 11972979 |
1D vertical edge blocking (VEB) via and plug |
Leonard P. GULER, Suzanne S. Rich, Charles H. Wallace, Curtis W. Ward, Richard E. Schenker +4 more |
2024-04-30 |
| 11721580 |
1D vertical edge blocking (VEB) via and plug |
Leonard P. GULER, Suzanne S. Rich, Charles H. Wallace, Curtis W. Ward, Richard E. Schenker +4 more |
2023-08-08 |
| 11594637 |
Gate-all-around integrated circuit structures having fin stack isolation |
Leonard P. GULER, Stephen D. Snyder, Biswajeet Guha, William Hsu, Urusa Alaan +4 more |
2023-02-28 |
| 11569231 |
Non-planar transistors with channel regions having varying widths |
Stephen D. Snyder, Leonard P. GULER, Richard E. Schenker, Sam Sivakumar, Urusa Alaan +2 more |
2023-01-31 |
| 9916988 |
Sacrificial material for stripping masking layers |
Shakuntala Sundararajan, Nadia M. Rahhal-Orabi, Leonard P. GULER, Ralph T. Troeger |
2018-03-13 |
| 9905693 |
Trigate transistor structure with unrecessed field insulator and thinner electrodes over the field insulator |
Michael L. Hattendorf, Pragyansri Pathi |
2018-02-27 |
| 9768249 |
Trigate transistor structure with unrecessed field insulator and thinner electrodes over the field insulator |
Michael L. Hattendorf, Pragyansri Pathi |
2017-09-19 |
| 8629039 |
Substrate fins with different heights |
Willy Rachmady, Justin S. Sandford |
2014-01-14 |
| 8441074 |
Substrate fins with different heights |
Willy Rachmady, Justin S. Sandford |
2013-05-14 |
| 8377771 |
Recessed workfunction metal in CMOS transistor gates |
Willy Rachmady, Brian McIntrye, Subhash M. Joshi |
2013-02-19 |
| 8314034 |
Feature size reduction |
Elliot N. Tan |
2012-11-20 |
| 8193641 |
Recessed workfunction metal in CMOS transistor gates |
Willy Rachmady, Brian McIntyre, Subhash M. Joshi |
2012-06-05 |
| 7977248 |
Double patterning with single hard mask |
Elliot N. Tan, James Jeong |
2011-07-12 |