| 12224317 |
Vertical power semiconductor device and manufacturing method |
Hans-Joachim Schulze, Christian Jaeger, Daniel Schloegl, Benedikt Stoib |
2025-02-11 |
| 12057316 |
Semiconductor device fabricated using channeling implant |
Paul Ellinghaus, Axel Koenig, Caspar Leendertz, Hans-Joachim Schulze, Werner Schustereder |
2024-08-06 |
| 11908694 |
Ion beam implantation method and semiconductor device |
Michael Hell, Caspar Leendertz, Kristijan Luka MLETSCHNIG, Hans-Joachim Schulze |
2024-02-20 |
| 11764063 |
Silicon carbide device with compensation region and method of manufacturing |
Hans-Joachim Schulze, Romain Esteve, Caspar Leendertz, Werner Schustereder |
2023-09-19 |
| 11742384 |
Vertical power semiconductor device including a field stop region having a plurality of impurity peaks |
Hans-Joachim Schulze, Christian Jaeger, Daniel Schloegl, Benedikt Stoib |
2023-08-29 |
| 11569392 |
Power semiconductor diode including field stop region |
Hans-Joachim Schulze, Christian Jaeger, Daniel Schloegl, Benedikt Stoib |
2023-01-31 |
| 11552172 |
Silicon carbide device with compensation layer and method of manufacturing |
Caspar Leendertz, Romain Esteve, Anton Mauder, Hans-Joachim Schulze, Werner Schustereder |
2023-01-10 |
| 11264459 |
Power semiconductor device |
Roman Baburske, Franz-Josef Niedernostheide, Frank Pfirsch, Christian Philipp Sandow, Hans-Joachim Schulze |
2022-03-01 |
| 11195695 |
Ion implantation method, ion implantation apparatus and semiconductor device |
Michael Brugger, Hans-Joachim Schulze, Werner Schustereder, Peter Zupan |
2021-12-07 |
| 11127839 |
Method of manufacturing a trench oxide in a trench for a gate structure in a semiconductor substrate |
Kang Nan Khor, Armin Schieber, Michael Stadtmueller, Wei-Lin Sun |
2021-09-21 |
| 11043384 |
Method of manufacturing a semiconductor device by using ion beam technique |
Michael Kokot, Christian Krueger, Hans-Joachim Schulze, Werner Schustereder |
2021-06-22 |
| 11018252 |
Power semiconductor transistor |
Hans Peter Felsl, Volodymyr Komarnitskyy, Konrad Schraml, Hans-Joachim Schulze |
2021-05-25 |
| 10622268 |
Apparatus and method for ion implantation |
Johannes Georg Laven, Werner Schustereder, Hans-Joachim Schulze |
2020-04-14 |
| 10529838 |
Semiconductor device having a variable carbon concentration |
Hans-Joachim Schulze, Johannes Georg Laven, Helmut Oefner, Werner Schustereder |
2020-01-07 |
| 10317338 |
Method and assembly for determining the carbon content in silicon |
Naveen Goud Ganagona, Helmut Oefner, Hans-Joachim Schulze, Werner Schustereder |
2019-06-11 |
| 10192955 |
Semiconductor device containing oxygen-related thermal donors |
Johannes Georg Laven, Hans-Joachim Schulze, Werner Schustereder, Michael Stadtmueller |
2019-01-29 |
| 10128328 |
Method of manufacturing semiconductor devices and semiconductor device containing hydrogen-related donors |
Hans Weber, Hans-Joachim Schulze, Johannes Georg Laven, Werner Schustereder |
2018-11-13 |
| 10096677 |
Methods for forming a semiconductor device and a semiconductor device |
Naveen Goud Ganagona, Johannes Georg Laven, Hans-Joachim Schulze, Werner Schustereder |
2018-10-09 |
| 10037887 |
Method for implanting ions into a semiconductor substrate and an implantation system |
Michael Brugger, Johannes Georg Laven, Hans-Joachim Schulze, Werner Schustereder |
2018-07-31 |
| 9972704 |
Method for forming a semiconductor device and a semiconductor device |
Johannes Georg Laven, Helmut Oefner, Hans-Joachim Schulze, Werner Schustereder |
2018-05-15 |
| 9825131 |
Method of manufacturing semiconductor devices and semiconductor device containing oxygen-related thermal donors |
Johannes Georg Laven, Hans-Joachim Schulze, Werner Schustereder, Michael Stadtmueller |
2017-11-21 |
| 9634086 |
Method of manufacturing semiconductor devices using light ion implantation and semiconductor device |
Johannes Georg Laven, Hans-Joachim Schulze, Werner Schustereder |
2017-04-25 |
| 9564495 |
Semiconductor device with a semiconductor body containing hydrogen-related donors |
Johannes Georg Laven, Hans-Joachim Schulze, Werner Schustereder |
2017-02-07 |
| 9312135 |
Method of manufacturing semiconductor devices including generating and annealing radiation-induced crystal defects |
Johannes Georg Laven, Hans-Joachim Schulze, Werner Schustereder |
2016-04-12 |
