SK

Subhash B. Kulkarni

IBM: 14 patents #8,004 of 70,183Top 15%
Infineon Technologies Ag: 1 patents #4,439 of 7,486Top 60%
Overall (All Time): #355,956 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7144769 Method to achieve increased trench depth, independent of CD as defined by lithography Kevin K. Chan, Gangadhara S. Mathad, Rajiv Ranade 2006-12-05
6821864 Method to achieve increased trench depth, independent of CD as defined by lithography Kevin K. Chan, Gangadhara S. Mathad, Rajiv Ranade 2004-11-23
6809005 Method to fill deep trench structures with void-free polysilicon or silicon Rajiv Ranade, Gangadhara S. Mathad, Kevin K. Chan 2004-10-26
6563173 Silicon-on-insulator chip having an isolation barrier for reliability Ronald J. Bolam, Dominic J. Schepis 2003-05-13
6492684 Silicon-on-insulator chip having an isolation barrier for reliability Ronald J. Bolam, Dominic J. Schepis 2002-12-10
6281095 Process of manufacturing silicon-on-insulator chip having an isolation barrier for reliability Ronald J. Bolam, Dominic J. Schepis 2001-08-28
6133610 Silicon-on-insulator chip having an isolation barrier for reliability and process of manufacture Ronald J. Bolam, Dominic J. Schepis 2000-10-17
6022766 Semiconductor structure incorporating thin film transistors, and methods for its manufacture Bomy Chen, Jerome B. Lasky, Randy W. Mann, Edward J. Nowak, Werner Rausch +1 more 2000-02-08
5757050 Field effect transistor having contact layer of transistor gate electrode material Eric Adler, Randy W. Mann, Werner Rausch, Luigi Ternullo, Jr. 1998-05-26
5744384 Semiconductor structures which incorporate thin film transistors Eric Adler, Randy W. Mann, Werner Rausch, Luigi Ternullo, Jr. 1998-04-28
5675185 Semiconductor structure incorporating thin film transistors with undoped cap oxide layers Bomy Chen, Jerome B. Lasky, Randy W. Mann, Edward J. Nowak, Werner Rausch +1 more 1997-10-07
5670812 Field effect transistor having contact layer of transistor gate electrode material Eric Adler, Randy W. Mann, Werner Rausch, Luigi Ternullo, Jr. 1997-09-23
5562770 Semiconductor manufacturing process for low dislocation defects Bomy Chen, Terence B. Hook 1996-10-08
4504330 Optimum reduced pressure epitaxial growth process to prevent autodoping Arun K. Gaind, Michael R. Poponiak 1985-03-12