Issued Patents All Time
Showing 276–300 of 341 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6313492 | Integrated circuit chip produced by using frequency doubling hybrid photoresist | Mark C. Hakey, David V. Horak, Ahmad D. Katnani, Niranjan M. Patel, Paul A. Rabidoux | 2001-11-06 |
| 6303272 | Process for self-alignment of sub-critical contacts to wiring | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2001-10-16 |
| 6284439 | "Method of producing an integrated circuit chip using low ""k"" factor hybrid photoresist and apparatus formed thereby" | Ahmad D. Katnani, Niranjan M. Patel, Paul A. Rabidoux | 2001-09-04 |
| 6277543 | Method for forming features using frequency doubling hybrid resist and device formed thereby | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2001-08-21 |
| 6271555 | Borderless wordline for DRAM cell | Mark C. Hakey, David V. Horak, Wendell P. Noble | 2001-08-07 |
| 6258661 | Formation of out-diffused bitline by laser anneal | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Thomas S. Kanarsky | 2001-07-10 |
| 6255178 | Method for forming transistors with raised source and drains and device formed thereby | Jeffrey S. Brown, James S. Dunn, David V. Horak, Robert K. Leidy, Steven H. Voldman | 2001-07-03 |
| 6245488 | Method for forming features using frequency doubling hybrid resist and device formed thereby | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2001-06-12 |
| 6232639 | Method and structure to reduce latch-up using edge implants | Faye D. Baker, Jeffrey S. Brown, Robert J. Gauthier, Jr., Robert K. Leidy, Edward J. Nowak +1 more | 2001-05-15 |
| 6228705 | Overlay process for fabricating a semiconductor device | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, William H. Ma | 2001-05-08 |
| 6221704 | Process for fabricating short channel field effect transistor with a highly conductive gate | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, James S. Nakos, Paul A. Rabidoux | 2001-04-24 |
| 6221680 | Patterned recess formation using acid diffusion | Mark C. Hakey, David V. Horak, Toshiharu Furukawa | 2001-04-24 |
| 6221562 | Resist image reversal by means of spun-on-glass | Diane C. Boyd, Toshiharu Furukawa, William H. Ma, Paul A. Rabidoux, David V. Horak | 2001-04-24 |
| 6218704 | ESD protection structure and method | Jeffrey S. Brown, Robert K. Leidy, Steven H. Voldman | 2001-04-17 |
| 6210866 | Method for forming features using self-trimming by selective etch and device formed thereby | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2001-04-03 |
| 6207493 | Formation of out-diffused bitline by laser anneal | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Thomas S. Kanarsky | 2001-03-27 |
| 6207540 | Method for manufacturing high performance MOSFET device with raised source and drain | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, William H. Ma, Jack A. Mandelman | 2001-03-27 |
| 6207514 | Method for forming borderless gate structures and apparatus formed thereby | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2001-03-27 |
| 6200726 | Optimization of space width for hybrid photoresist | Kuang-Jung Chen, Wu-Song Huang, Ahmad D. Katnani, Paul A. Rabidoux | 2001-03-13 |
| 6194268 | Printing sublithographic images using a shadow mandrel and off-axis exposure | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2001-02-27 |
| 6190988 | Method for a controlled bottle trench for a dram storage node | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, William H. Ma, James M. Never | 2001-02-20 |
| 6184151 | Method for forming cornered images on a substrate and photomask formed thereby | William J. Adair, Richard A. Ferguson, Mark C. Hakey, David V. Horak, Robert K. Leidy +3 more | 2001-02-06 |
| 6184041 | Fused hybrid resist shapes as a means of modulating hybrid resist space width | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2001-02-06 |
| 6150256 | Method for forming self-aligned features | Toshiharu Furukawa, Mark C. Hakey, David V. Horak, Paul A. Rabidoux | 2000-11-21 |
| 6147394 | Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby | James A. Bruce, Robert K. Leidy, Walter E. Mlynko, Edward W. Sengle | 2000-11-14 |