Issued Patents All Time
Showing 51–75 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7235342 | Negative photoresist composition including non-crosslinking chemistry | Wenjie Li | 2007-06-26 |
| 7217496 | Fluorinated photoresist materials with improved etch resistant properties | Mahmoud Khojasteh, Wenjie Li, Kuang-Jung Chen, Kaushal S. Patel | 2007-05-15 |
| 7183036 | Low activation energy positive resist | Mahmoud Khojasteh, Kuang-Jung Chen | 2007-02-27 |
| 7129016 | Positive resist containing naphthol functionality | Mahmoud Khojasteh, Kuang-Jung Chen | 2006-10-31 |
| 7087356 | 193nm resist with improved post-exposure properties | Mahmoud Khojasteh, Kuang-Jung Chen, Yukio Nishimura, Eiichi Kobayashi | 2006-08-08 |
| 7081326 | Negative photoresist and method of using thereof | Wenjie Li | 2006-07-25 |
| 7063931 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | Wenjie Li | 2006-06-20 |
| 7011923 | Negative photoresist and method of using thereof | Wenjie Li | 2006-03-14 |
| 6991890 | Negative photoresist composition involving non-crosslinking chemistry | Wenjie Li, Alyssandrea Hope Hamad | 2006-01-31 |
| 6949325 | Negative resist composition with fluorosulfonamide-containing polymer | Wenjie Li | 2005-09-27 |
| 6927015 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, William R. Brunsvold, Margaret C. Lawson +4 more | 2005-08-09 |
| 6902874 | Resist compositions with polymers having 2-cyano acrylic monomer | Wenjie Li | 2005-06-07 |
| 6818381 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, William R. Brunsvold, Margaret C. Lawson +4 more | 2004-11-16 |
| 6770418 | Positive resist compositions containing non-polymeric silicon | Wenjie Li, Ranee W. Kwong | 2004-08-03 |
| 6770419 | Low silicon-outgassing resist for bilayer lithography | Mahmoud Khojasteh, Ranee W. Kwong, Kuang-Jung Chen, Robert David Allen, Phillip Brock +2 more | 2004-08-03 |
| 6756180 | Cyclic olefin-based resist compositions having improved image stability | Wenjie Li, Masafumi Yamamoto | 2004-06-29 |
| 6696216 | Thiophene-containing photo acid generators for photolithography | Wenjie Li, Kuang-Jung Chen | 2004-02-24 |
| 6635401 | Resist compositions with polymers having 2-cyano acrylic monomer | Wenjie Li | 2003-10-21 |
| 6627391 | Resist compositions containing lactone additives | Hiroshi Ito | 2003-09-30 |
| 6562554 | Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives | Joseph F. Maniscalco | 2003-05-13 |
| 6534239 | Resist compositions with polymers having pendant groups containing plural acid labile moieties | Margaret C. Lawson, Wenjie Li | 2003-03-18 |
| 6420503 | Norbornene sulfonamide polymers | Saikumar Jayaraman, Richard Vicari, Larry F. Rhodes, Thomas I. Wallow, Ratnam Sooriyakumaran +4 more | 2002-07-16 |
| 6391521 | Resist compositions containing bulky anhydride additives | Hiroshi Ito | 2002-05-21 |
| 6372406 | Deactivated aromatic amines as additives in acid-catalyzed resists | William R. Brunsvold, Ahmad D. Katnani | 2002-04-16 |
| 6265134 | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching | Ahmad D. Katnani, Mahmoud Khojasteh, Ranee W. Kwong | 2001-07-24 |