Issued Patents All Time
Showing 26–50 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8202678 | Wet developable bottom antireflective coating composition and method for use thereof | Kuang-Jung Chen, Mahmoud Khojasteh, Ranee W. Kwong, Margaret C. Lawson, Wenjie Li +1 more | 2012-06-19 |
| 8182978 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | Wu-Song Huang, Libor Vyklicky | 2012-05-22 |
| 8097401 | Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same | Wu-Song Huang, Irene Popova, Libor Vyklicky | 2012-01-17 |
| 8053172 | Photoresists and methods for optical proximity correction | Scott D. Halle, Wu-Song Huang, Ranee W. Kwong | 2011-11-08 |
| 8034533 | Fluorine-free heteroaromatic photoacid generators and photoresist compositions containing the same | Sen Liu | 2011-10-11 |
| 8029975 | Fused aromatic structures and methods for photolithographic applications | James J. Bucchignano, Wu-Song Huang, Roy R. Yu | 2011-10-04 |
| 8021828 | Photoresist compositions and methods related to near field masks | Wu-Song Huang, Ranee W. Kwong | 2011-09-20 |
| 8017303 | Ultra low post exposure bake photoresist materials | Dario L. Goldfarb, Mahmoud Khojasteh | 2011-09-13 |
| 7838200 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Kuang-Jung Chen, Wu-Song Huang, Wai-Kin Li, Sen Liu | 2010-11-23 |
| 7838198 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | Kuang-Jung Chen, Wu-Song Huang, Wai-Kin Li | 2010-11-23 |
| 7816068 | Underlayer compositions containing heterocyclic aromatic structures | Wu-Song Huang, Karen Temple | 2010-10-19 |
| 7807332 | Underlayer compositions containing heterocyclic aromatic structures | Wu-Song Huang, Karen Temple | 2010-10-05 |
| 7803521 | Photoresist compositions and process for multiple exposures with multiple layer photoresist systems | Kuang-Jung Chen, Wu-Song Huang, Wai-Kin Li | 2010-09-28 |
| 7754820 | Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application | Wu-Song Huang, Wenjie Li | 2010-07-13 |
| 7700262 | Top coat material and use thereof in lithography processes | Wenjie Li, Margaret C. Lawson | 2010-04-20 |
| 7651831 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | Wenjie Li | 2010-01-26 |
| 7638264 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | Wenjie Li | 2009-12-29 |
| 7608390 | Top antireflective coating composition containing hydrophobic and acidic groups | Mahmoud Khojasteh, Wu-Song Huang, Margaret C. Lawson, Kaushal S. Patel, Irene Popova | 2009-10-27 |
| 7566527 | Fused aromatic structures and methods for photolithographic applications | James J. Bucchignano, Wu-Song Huang, Roy R. Yu | 2009-07-28 |
| 7563563 | Wet developable bottom antireflective coating composition and method for use thereof | Kuang-Jung Chen, Mahmoud Khojasteh, Ranee W. Kwong, Margaret C. Lawson, Wenjie Li +1 more | 2009-07-21 |
| 7544750 | Top antireflective coating composition with low refractive index at 193nm radiation wavelength | Wu-Song Huang, William H. Heath, Kaushal S. Patel | 2009-06-09 |
| 7435537 | Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application | Wu-Song Huang, Wenjie Li | 2008-10-14 |
| 7375172 | Underlayer compositions containing heterocyclic aromatic structures | Wu-Song Huang, Karen Temple | 2008-05-20 |
| 7335456 | Top coat material and use thereof in lithography processes | Wenjie Li, Margaret C. Lawson | 2008-02-26 |
| 7320855 | Silicon containing TARC/barrier layer | Wu-Song Huang, Sean D. Burns | 2008-01-22 |