Issued Patents All Time
Showing 51–59 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6184572 | Interlevel dielectric stack containing plasma deposited fluorinated amorphous carbon films for semiconductor devices | Thomas W. Mountsier | 2001-02-06 |
| 6166437 | Silicon on silicon package with precision align macro | Sang Hoo Dhong, Kevin John Nowka | 2000-12-26 |
| 6150258 | Plasma deposited fluorinated amorphous carbon films | Thomas W. Mountsier | 2000-11-21 |
| 6057250 | Low temperature reflow dielectric-fluorinated BPSG | Markus Kirchhoff, Ashima B. Chakravarti, Matthias Ilg, Kevin A. McKinley, Son V. Nguyen | 2000-05-02 |
| 5712702 | Method and apparatus for determining chamber cleaning end point | Vincent J. McGahay, James G. Ryan, Christopher J. Waskiewicz | 1998-01-27 |
| 5643640 | Fluorine doped plasma enhanced phospho-silicate glass, and process | Ashima B. Chakravarti, Terry M. Cheng, Son Van Nguyen | 1997-07-01 |
| 5603988 | Method for depositing a titanium or tantalum nitride or nitride silicide | Ravi Kanjolia, Ben C. Hui, Paul F. Seidler, Karen L. Holloway, Richard A. Conti +1 more | 1997-02-18 |
| 5563105 | PECVD method of depositing fluorine doped oxide using a fluorine precursor containing a glass-forming element | David M. Dobuzinsky, Tetsuo Matsuda, Son V. Nguyen, James G. Ryan | 1996-10-08 |
| 5352656 | Method for the chemical vapor deposition of group IB and group VIIIB metal barrier layers | Walter J. Lackey, John A. Hanigofsky, David N. Hill, E. Kent Barefield, William B. Carter | 1994-10-04 |