JZ

Jingyun Zhang

IBM: 169 patents #229 of 70,183Top 1%
CH Chemimage: 4 patents #23 of 67Top 35%
Huawei: 4 patents #3,171 of 15,535Top 25%
ET Elpis Technologies: 2 patents #16 of 121Top 15%
CEA: 2 patents #2,014 of 7,956Top 30%
TE Tencent: 2 patents #2,702 of 8,131Top 35%
BC Beijing Kuaimajiabian Technology Co.: 1 patents #50 of 91Top 55%
📍 Albany, NY: #3 of 790 inventorsTop 1%
🗺 New York: #174 of 115,490 inventorsTop 1%
Overall (All Time): #3,939 of 4,157,543Top 1%
186
Patents All Time

Issued Patents All Time

Showing 151–175 of 186 patents

Patent #TitleCo-InventorsDate
10566435 Gate stack quality for gate-all-around field-effect transistors Takashi Ando, Choonghyun Lee 2020-02-18
10559692 Nanosheet substrate isolation scheme by lattice matched wide bandgap semiconductor Alexander Reznicek, Xin Miao, Choonghyun Lee 2020-02-11
10559676 Vertical FET with differential top spacer Takashi Ando, Choonghyun Lee, Pouya Hashemi 2020-02-11
10553696 Full air-gap spacers for gate-all-around nanosheet field effect transistors Takashi Ando, Pouya Hashemi, Choonghyun Lee, Alexander Reznicek 2020-02-04
10553679 Formation of self-limited inner spacer for gate-all-around nanosheet FET Takashi Ando, Choonghyun Lee, Alexander Reznicek, Pouya Hashemi 2020-02-04
10553678 Vertically stacked dual channel nanosheet devices Choonghyun Lee, Pouya Hashemi, Takashi Ando, Alexander Reznicek 2020-02-04
10546925 Vertically stacked nFET and pFET with dual work function Alexander Reznicek, Takashi Ando, Choonghyun Lee, Pouya Hashemi 2020-01-28
10541239 Semiconductor device and method of forming the semiconductor device Robin Hsin Kuo Chao, Hemanth Jagannathan, Choonghyun Lee, Chun Wing Yeung 2020-01-21
10529716 Asymmetric threshold voltage VTFET with intrinsic dual channel epitaxy Choonghyun Lee, Takashi Ando, Alexander Reznicek, Pouya Hashemi 2020-01-07
10529850 Vertical field-effect transistor including a fin having sidewalls with a tapered bottom profile Chun Wing Yeung, Choonghyun Lee, Robin Hsin Kuo Chao, Heng Wu 2020-01-07
10522419 Stacked field-effect transistors (FETs) with shared and non-shared gates Takashi Ando, Pouya Hashemi, Choonghyun Lee, Alexander Reznicek 2019-12-31
10468532 Nanosheet substrate isolation scheme by lattice matched wide bandgap semiconductor Alexander Reznicek, Xin Miao, Choonghyun Lee 2019-11-05
10453937 Self-limited inner spacer formation for gate-all-around field effect transistors Robinhsinku Chao, Choonghyun Lee, Heng Wu, Chun Wing Yeung 2019-10-22
10439063 Close proximity and lateral resistance reduction for bottom source/drain epitaxy in vertical transistor devices Alexander Reznicek, Shogo Mochizuki, Xin Miao 2019-10-08
10381438 Vertically stacked NFETS and PFETS with gate-all-around structure Takashi Ando, Pouya Hashemi, Choonghyun Lee, Alexander Reznicek 2019-08-13
10361131 Stacked field-effect transistors (FETs) with shared and non-shared gates Takashi Ando, Pouya Hashemi, Choonghyun Lee, Alexander Reznicek 2019-07-23
10355103 Long channels for transistors Robin Hsin Kuo Chao, Choonghyun Lee, Heng Wu, Chun Wing Yeung 2019-07-16
10347743 Vertical transport fin field effect transistor (VT FinFET) having an uniform L-shaped inner spacer Kangguo Cheng, Juntao Li, Peng Xu 2019-07-09
10332809 Method and structure to introduce strain in stack nanosheet field effect transistor Takashi Ando, Choonghyun Lee, Pouya Hashemi, Alexander Reznicek 2019-06-25
10326001 Self-limited inner spacer formation for gate-all-around field effect transistors Robinhsinku Chao, Choonghyun Lee, Heng Wu, Chun Wing Yeung 2019-06-18
10319846 Multiple work function nanosheet field-effect transistors with differential interfacial layer thickness Takashi Ando, Choonghyun Lee, Pouya Hashemi 2019-06-11
10312326 Long channels for transistors Robin Hsin Kuo Chao, Choonghyun Lee, Heng Wu, Chun Wing Yeung 2019-06-04
10243060 Uniform low-k inner spacer module in gate-all-around (GAA) transistors Robin Hsin Kuo Chao, Choonghyun Lee, Chun Wing Yeung 2019-03-26
10236217 Stacked field-effect transistors (FETs) with shared and non-shared gates Takashi Ando, Pouya Hashemi, Choonghyun Lee, Alexander Reznicek 2019-03-19
10217841 Forming an uniform L-shaped inner spacer for a vertical transport fin field effect transistor (VT FinFET) Kangguo Cheng, Juntao Li, Peng Xu 2019-02-26