Issued Patents All Time
Showing 51–61 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6334097 | Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methods | Masataka Shiba, Atsushi Shimoda | 2001-12-25 |
| 6281024 | Semiconductor device inspection and analysis method and its apparatus and a method for manufacturing a semiconductor device | Kenji Watanabe, Yoshimasa Fukushima, Minori Noguchi | 2001-08-28 |
| 5684565 | Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system | Yoshitada Oshida, Hisafumi Iwata, Minoru Yoshida, Yukihiro Shibata | 1997-11-04 |
| 5371570 | Refractive/diffractive optical system for broad-band through-the-lens imaging of alignment marks on substrates in stepper machines | G. Michael Morris | 1994-12-06 |
| 5324953 | Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens | Yoshitada Oshida, Masataka Shiba, Yasuhiko Nakayama | 1994-06-28 |
| 5164789 | Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference | Yoshitada Oshida, Soichi Katagiri, Shuji Sugiyama, Yoshimitsu Saze | 1992-11-17 |
| 5016149 | Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same | Minoru Tanaka, Yoshitada Oshida, Tetsuzo Tanimoto | 1991-05-14 |
| 4993837 | Method and apparatus for pattern detection | Yoshitada Oshida, Naoto Nakashima, Masataka Shiba | 1991-02-19 |
| 4922290 | Semiconductor exposing system having apparatus for correcting change in wavelength of light source | Yoshitada Oshida | 1990-05-01 |
| 4862008 | Method and apparatus for optical alignment of semiconductor by using a hologram | Yoshitada Oshida, Naoto Nakashima | 1989-08-29 |
| 4819033 | Illumination apparatus for exposure | Yoshitada Oshida, Masataka Shiba, Naoto Nakashima | 1989-04-04 |