Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9150964 | Vacuum processing apparatus | Hiroyuki Kobayashi, Masaru Izawa, Kenji Maeda | 2015-10-06 |
| 9038567 | Plasma processing apparatus | Hiroyuki Kobayashi, Kenji Maeda, Masaru Izawa, Tadamitsu Kanekiyo | 2015-05-26 |
| 8955579 | Plasma processing apparatus and plasma processing method | Takumi Tandou, Masaru Izawa | 2015-02-17 |
| 8733282 | Plasma processing apparatus | Hiroyuki Kobayashi, Kenji Maeda, Masaru Izawa, Tadamitsu Kanekiyo | 2014-05-27 |
| 8496781 | Plasma processing apparatus | Kenji Maeda, Masaru Izawa | 2013-07-30 |
| 8426764 | Plasma processing apparatus and plasma processing method | Takumi Tandou, Masaru Izawa | 2013-04-23 |
| 8425786 | Plasma etching method and plasma etching apparatus | Makoto Satake, Kenji Maeda, Tsutomu Tetsuka, Tatehito Usui, Ryoji Nishio | 2013-04-23 |
| 8397668 | Plasma processing apparatus | Hiroyuki Kobayashi, Kenji Maeda, Masaru Izawa, Tadamitsu Kanekiyo | 2013-03-19 |
| 8197634 | Plasma processing apparatus | Tatehito Usui | 2012-06-12 |
| 8163652 | Plasma processing method and plasma processing device | Kenji Maeda, Tomoyuki Tamura, Hiroyuki Kobayashi, Tadamitsu Kanekiyo | 2012-04-24 |
| 8083888 | Plasma processing apparatus | Tatehito Usui, Tsuyoshi Yoshida, Tsuyoshi Matsumoto, Satoru Muto | 2011-12-27 |
| 8029874 | Plasma processing apparatus and method for venting the same to atmosphere | Hiroyuki Kobayashi, Kenji Maeda, Masaru Izawa | 2011-10-04 |
| 7842619 | Plasma processing method | Masatoshi Miyake, Kenji Maeda, Masaru Izawa | 2010-11-30 |
| 7767054 | Plasma processing apparatus | Hiroyuki Kobayashi, Masaru Izawa, Tomoyuki Tamura, Kenji Maeda | 2010-08-03 |
| 7662232 | Plasma processing apparatus | Hiroyuki Kobayashi, Kenji Maeda, Masaru Izawa, Tadamitsu Kanekiyo | 2010-02-16 |
| 7658815 | Plasma processing apparatus capable of controlling plasma emission intensity | Kenji Maeda, Tadamitsu Kanekiyo | 2010-02-09 |
| 7435687 | Plasma processing method and plasma processing device | Kenji Maeda, Tomoyuki Tamura, Hiroyuki Kobayashi, Tadamitsu Kanekiyo | 2008-10-14 |
| 7371690 | Dry etching method and apparatus | Nobuyuki Negishi, Masaru Izawa | 2008-05-13 |
| 7372582 | Method for fabrication semiconductor device | Nobuyuki Negishi, Masaru Izawa | 2008-05-13 |
| 6977229 | Manufacturing method for semiconductor devices | Yoshinori Momonoi, Masaru Izawa | 2005-12-20 |
| 6927173 | Plasma processing method | Masahito Mori, Shinichi Tachi | 2005-08-09 |
| 6713401 | Method for manufacturing semiconductor device | Yoshinori Momonoi, Kazunori Tsujimoto, Shinichi Tachi | 2004-03-30 |
| 6643893 | Apparatus for cleaning semiconductor wafers in a vacuum environment | Yoshinori Momonoi, Masaru Izawa, Shinichi Tachi | 2003-11-11 |
| 6629538 | Method for cleaning semiconductor wafers in a vacuum environment | Yoshinori Momonoi, Masaru Izawa, Shinichi Tachi | 2003-10-07 |
| 6579154 | Dry chemical-mechanical polishing method | Seiji Yamamoto, Shinichi Tachi | 2003-06-17 |