CP

Chung-Shih Pan

HM Hermes Microvision: 16 patents #10 of 68Top 15%
AB Asml Netherlands B.V.: 2 patents #1,484 of 3,192Top 50%
KI Kla Instruments: 1 patents #46 of 99Top 50%
Overall (All Time): #219,556 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11662323 Method and system for inspecting an EUV mask Guochong Weng, Youjin Wang, Chiyan Kuan 2023-05-30
10775325 Method and system for inspecting an EUV mask Guochong Weng, Youjin Wang, Chiyan Kuan 2020-09-15
10088438 Method and system for inspecting an EUV mask Guochong Weng, Youjin Wang, Chiyan Kuan 2018-10-02
10054556 Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask You-Jin Wang, Chiyan Kuan 2018-08-21
9859089 Method and system for inspecting and grounding an EUV mask Guochong Weng, Youjin Wang, Chiyan Kuan 2018-01-02
9572237 Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask You-Jin Wang, Chiyan Kuan 2017-02-14
9485846 Method and system for inspecting an EUV mask Guochong Weng, Youjin Wang, Chiyan Kuan 2016-11-01
9460887 Discharging method for charged particle beam imaging You-Jin Wang 2016-10-04
9164399 Reticle operation system Youjin Wang, Chiyan Kuan 2015-10-20
9113538 Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask You-Jin Wang, Chiyan Kuan 2015-08-18
8604428 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system You-Jin Wang 2013-12-10
8575573 Structure for discharging extreme ultraviolet mask You-Jin Wang, Chiyan Kuan 2013-11-05
8519333 Charged particle system for reticle/wafer defects inspection and review Chiyan Kuan, Yi Wang, Zhonghua Dong, Zhongwei Chen 2013-08-27
8110818 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system You-Jin Wang 2012-02-07
8094924 E-beam defect review system Jack Jau, Zhongwei Chen, Yi Wang, Joe Wang, Xuedong Liu +2 more 2012-01-10
8031344 Z-stage configuration and application thereof You-Jin Wang 2011-10-04
7868303 Method and handling apparatus for placing patterning device on support member for charged particle beam imaging You-Jin Wang, Hsuan-Bin Huang 2011-01-11
7838848 Patterning device holding apparatus and application thereof Hsuan-Bin Huang, You-Jin Wang 2010-11-23
6791095 Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus Yi Wang, Anil Desai 2004-09-14
5502306 Electron beam inspection system and method Dan Meisburger, Alan D. Brodie, Curt H. Chadwick, Anil Desai, Hans-Peter Dohse +28 more 1996-03-26