Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12142451 | System for inspecting and grounding a mask in a charged particle system | Tianming Chen, Yixiang Wang, Zhi Wang | 2024-11-12 |
| 11662323 | Method and system for inspecting an EUV mask | Guochong Weng, Youjin Wang, Chung-Shih Pan | 2023-05-30 |
| 11448607 | Charged particle beam inspection of ungrounded samples | — | 2022-09-20 |
| 11366153 | Micro LED display panel | Tzu-Yi Kuo, Cheng Ta Kao, Yu-Kuang Tseng | 2022-06-21 |
| 10775325 | Method and system for inspecting an EUV mask | Guochong Weng, Youjin Wang, Chung-Shih Pan | 2020-09-15 |
| 10088438 | Method and system for inspecting an EUV mask | Guochong Weng, Youjin Wang, Chung-Shih Pan | 2018-10-02 |
| 10054556 | Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask | You-Jin Wang, Chung-Shih Pan | 2018-08-21 |
| 9859089 | Method and system for inspecting and grounding an EUV mask | Guochong Weng, Youjin Wang, Chung-Shih Pan | 2018-01-02 |
| 9572237 | Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask | You-Jin Wang, Chung-Shih Pan | 2017-02-14 |
| 9485846 | Method and system for inspecting an EUV mask | Guochong Weng, Youjin Wang, Chung-Shih Pan | 2016-11-01 |
| 9436985 | Method and system for enhancing image quality | Joe Wang, Van-Duc Nguyen | 2016-09-06 |
| 9177758 | Charged particle beam apparatus | Zhongwei Chen, Jack Jau, Weiming Ren, Yixiang Wang, Xiaoli Guo +1 more | 2015-11-03 |
| 9164399 | Reticle operation system | Youjin Wang, Chung-Shih Pan | 2015-10-20 |
| 9113538 | Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask | You-Jin Wang, Chung-Shih Pan | 2015-08-18 |
| 9002097 | Method and system for enhancing image quality | Joe Wang, Van-Duc Nguyen | 2015-04-07 |
| 8692193 | Method for inspecting EUV reticle and apparatus thereof | Wei Fang, You-Jin Wang | 2014-04-08 |
| 8575573 | Structure for discharging extreme ultraviolet mask | You-Jin Wang, Chung-Shih Pan | 2013-11-05 |
| 8519333 | Charged particle system for reticle/wafer defects inspection and review | Yi Wang, Chung-Shih Pan, Zhonghua Dong, Zhongwei Chen | 2013-08-27 |
| 8295580 | Substrate and die defect inspection method | — | 2012-10-23 |
| 8217349 | Method for inspecting EUV reticle and apparatus thereof | Wei Fang, You-Jin Wang | 2012-07-10 |
| 7115866 | Site stepping for electron beam micro analysis | Roger Kroeze, David Aitan Soltz, David A. Crewe, Gregory W. Grant, Thierry H. C. Nguyen +2 more | 2006-10-03 |