| 10079300 |
Semiconductor circuit element |
Peter Baars |
2018-09-18 |
| 9608110 |
Methods of forming a semiconductor circuit element and semiconductor circuit element |
Peter Baars |
2017-03-28 |
| 9583640 |
Method including a formation of a control gate of a nonvolatile memory cell and semiconductor structure |
Ralf Richter, Sven Beyer, Tom Herrmann |
2017-02-28 |
| 9514942 |
Method of forming a gate mask for fabricating a structure of gate lines |
Elliot John Smith, Thorsten Kammler, Andreas Hellmich |
2016-12-06 |
| 9508588 |
Methods for fabricating integrated circuits with isolation regions having uniform step heights |
Martin Trentzsch, Sören Jansen |
2016-11-29 |
| 9337045 |
Methods of forming a semiconductor circuit element and semiconductor circuit element |
Peter Baars |
2016-05-10 |
| 9123825 |
Methods for fabricating FinFET integrated circuits using laser interference lithography techniques |
Sven Beyer, Alexander Ebermann, Jan Hoentschel |
2015-09-01 |
| 9123827 |
Methods for fabricating integrated circuits with fully silicided gate electrode structures |
Sven Beyer, Jan Hoentschel, Alexander Ebermann |
2015-09-01 |
| 8993459 |
Method of forming a material layer in a semiconductor structure |
Martin Trentzsch, Boris Bayha, Peter Krottenthaler |
2015-03-31 |
| 8951877 |
Transistor with embedded strain-inducing material formed in cavities based on an amorphization process and a heat treatment |
Nicolas Sassiat, Jan Hoentschel, Ran Yan, Ralf Richter |
2015-02-10 |
| 8872285 |
Metal gate structure for semiconductor devices |
Thilo Scheiper, Richard J. Carter, Martin Trentzsch |
2014-10-28 |
| 8735240 |
CET and gate current leakage reduction in high-k metal gate electrode structures by heat treatment after diffusion layer removal |
Torben Kelwing, Martin Trentzsch, Boris Bayha, Richard J. Carter |
2014-05-27 |
