Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7776731 | Method of removing defects from a dielectric material in a semiconductor | Kurt H. Junker, Tien Ying Luo | 2010-08-17 |
| 7704821 | In-situ nitridation of high-k dielectrics | Olubunmi O. Adetutu, Hsing-Huang Tseng | 2010-04-27 |
| 7659156 | Method to selectively modulate gate work function through selective Ge condensation and high-K dielectric layer | Voon-Yew Thean, Marc Rossow, Gregory S. Spencer, Tab A. Stephens, Victor H. Vartanian | 2010-02-09 |
| 7618902 | Plasma treatment of a semiconductor surface for enhanced nucleation of a metal-containing layer | Olubunmi O. Adetutu | 2009-11-17 |
| 7303983 | ALD gate electrode | Olubunmi O. Adetutu, James K. Schaeffer | 2007-12-04 |
| 7297586 | Gate dielectric and metal gate integration | Olubunmi O. Adetutu | 2007-11-20 |
| 7230264 | Semiconductor transistor having structural elements of differing materials | Voon-Yew Thean, Bich-Yen Nguyen | 2007-06-12 |
| 7132360 | Method for treating a semiconductor surface to form a metal-containing layer | James K. Schaeffer, Darrell Roan, Olubunmi O. Adetutu | 2006-11-07 |
| 7091568 | Electronic device including dielectric layer, and a process for forming the electronic device | Rama I. Hegde, Alexander Demkov, Philip J. Tobin | 2006-08-15 |
| 7071038 | Method of forming a semiconductor device having a dielectric layer with high dielectric constant | Olubunmi O. Adetutu, Randy W. Cotton | 2006-07-04 |
| 7015153 | Method for forming a layer using a purging gas in a semiconductor process | Olubunmi O. Adetutu, David C. Gilmer, Darrell Roan, James K. Schaeffer, Philip J. Tobin +1 more | 2006-03-21 |
| 6987063 | Method to reduce impurity elements during semiconductor film deposition | Olubunmi O. Adetutu, James K. Schaeffer | 2006-01-17 |
| 6979622 | Semiconductor transistor having structural elements of differing materials and method of formation | Voon-Yew Thean, Bich-Yen Nguyen | 2005-12-27 |
| 6835671 | Method of making an integrated circuit using an EUV mask formed by atomic layer deposition | Scott D. Hector, Bich-Yen Nguyen | 2004-12-28 |