Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7573081 | Method to fabricate horizontal air columns underneath metal inductor | Lap Chan, Kok Wai Chew, Chee Tee Chua | 2009-08-11 |
| 7112866 | Method to form a cross network of air gaps within IMD layer | Lap Chan, Kheng Chok Tee | 2006-09-26 |
| 7105420 | Method to fabricate horizontal air columns underneath metal inductor | Lap Chan, Kok Wai Chew, Chee Tee Chua | 2006-09-12 |
| 6764914 | Method of forming a high K metallic dielectric layer | Alex See, Shyue Fong Quek, Ting Cheong Ang, Wye Boon Loh, Sang Yee Loong +2 more | 2004-07-20 |
| 6730571 | Method to form a cross network of air gaps within IMD layer | Lap Chan, Kheng Chok Tee | 2004-05-04 |
| 6680239 | Effective isolation with high aspect ratio shallow trench isolation and oxygen or field implant | Kok Keng Ong, Alex See, Lap Chan | 2004-01-20 |
| 6610575 | Forming dual gate oxide thickness on vertical transistors by ion implantation | Chew Hoe Ang, Eng Hua Lim, Jia Zhen Zheng, Elgin Quek, Mei Sheng Zhou +1 more | 2003-08-26 |
| 6605501 | Method of fabricating CMOS device with dual gate electrode | Chew Hoe Ang, Eng Hua Lim, Jia Zhen Zheng, Elgin Quek, Mei Sheng Zhou | 2003-08-12 |
| 6566209 | Method to form shallow junction transistors while eliminating shorts due to junction spiking | Lap Chan, Ravishankar Sundaresan | 2003-05-20 |
| 6531750 | Shallow junction transistors which eliminating shorts due to junction spiking | Lap Chan, Ravishankar Sundaresan | 2003-03-11 |
| 6518133 | Method for fabricating a small dimensional gate with elevated source/drain structures | Alex See, Yeow Kheng Lim | 2003-02-11 |
| 6501122 | Flash device having a large planar area ono interpoly dielectric | Lap Chan | 2002-12-31 |
| 6492242 | Method of forming of high K metallic dielectric layer | Alex See, Shyuz Fong Quek, Ting Cheong Ang, Wye Boon Loh, Sang Yee Loong +2 more | 2002-12-10 |
| 6483148 | Self-aligned elevated transistor | Lap Chan | 2002-11-19 |
| 6380084 | Method to form high performance copper damascene interconnects by de-coupling via and metal line filling | Yeow Kheng Lim, Alex See, Subhash Gupta, Wang Ling Goh, Man Siu Tse | 2002-04-30 |
| 6326272 | Method for forming self-aligned elevated transistor | Lap Chan | 2001-12-04 |
| 6303418 | Method of fabricating CMOS devices featuring dual gate structures and a high dielectric constant gate insulator layer | Alex See, Lap Chan | 2001-10-16 |
| 6297109 | Method to form shallow junction transistors while eliminating shorts due to junction spiking | Lap Chan, Ravishankar Sundaresan | 2001-10-02 |
| 6252277 | Embedded polysilicon gate MOSFET | Lap Chan, Eng Fong Chor, Gong Hao, Teck Koon Lee | 2001-06-26 |
| 6221727 | Method to trap air at the silicon substrate for improving the quality factor of RF inductors in CMOS technology | Lap Chan, Johnny Kok Wai Chew, Chee Tee Chua | 2001-04-24 |
| 6207534 | Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing | Lap Chan, Teck Koon Lee | 2001-03-27 |
| 6150232 | Formation of low k dielectric | Lap Chan, Kok Keng Ong, Kheng Chok Tee | 2000-11-21 |
| 6140197 | Method of making spiral-type RF inductors having a high quality factor (Q) | Shau-Fu Sanford Chu, Kok Wai Chew, Chee Tee Chua | 2000-10-31 |
| 6096604 | Production of reversed flash memory device | Anqing Zhang, Zhifeng Xie, Eng Fong Chor | 2000-08-01 |
| 6064201 | Method and apparatus to image metallic patches embedded in a non-metal surface | Hao Gong, Eng Fong Chor, Lap Chan | 2000-05-16 |