SH

Shinichi Hara

Canon: 52 patents #676 of 19,416Top 4%
MI Mitutoyo: 8 patents #122 of 721Top 20%
AM Amgen: 4 patents #785 of 2,867Top 30%
HI Hitachi: 3 patents #10,712 of 28,497Top 40%
HK Hamamatsu Photonics K.K.: 3 patents #547 of 1,436Top 40%
SC Shibuya Kogyo Co.: 3 patents #18 of 173Top 15%
TO Tosoh: 3 patents #235 of 1,042Top 25%
VT Valeo Systemes Thermiques: 2 patents #138 of 433Top 35%
NE Nec: 2 patents #5,510 of 14,502Top 40%
ZG Zexel Gmbh: 2 patents #110 of 348Top 35%
ML Mitsubishi Paper Mills Limited: 2 patents #171 of 458Top 40%
VJ Valeo Thermal Systems Japan: 1 patents #12 of 49Top 25%
VC Valeo Climatisation: 1 patents #58 of 116Top 50%
VC Valeo Japan Co.: 1 patents #31 of 106Top 30%
KO Komatsu: 1 patents #1,163 of 2,087Top 60%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
RC Rengo Co.: 1 patents #36 of 118Top 35%
TC Tamagawa Seiki Co.: 1 patents #41 of 88Top 50%
📍 Yokohama, CA: #37 of 287 inventorsTop 15%
Overall (All Time): #17,519 of 4,157,543Top 1%
91
Patents All Time

Issued Patents All Time

Showing 26–50 of 91 patents

Patent #TitleCo-InventorsDate
7158209 Holding mechanism in exposure apparatus, and device manufacturing method 2007-01-02
7145632 Cooling apparatus Eiji Sakamoto, Yoshinori Miwa, Yasuo Hasegawa, Yoshiki Kino 2006-12-05
7106413 Cooling mechanism 2006-09-12
7102727 Optical system for use in exposure apparatus and device manufacturing method using the same 2006-09-05
7095480 Cooling apparatus Eiji Sakamoto, Yoshinori Miwa, Yasuo Hasegawa, Yoshiki Kino 2006-08-22
7081949 Illumination apparatus, projection exposure apparatus, and device fabrication method 2006-07-25
7072438 Reflection type mask Keiko Chiba, Masami Tsukamoto, Yutaka Watanabe, Hiroshi Maehara 2006-07-04
7068348 Holding mechanism in exposure apparatus, and device manufacturing method 2006-06-27
7054705 Method of manufacturing semiconductor devices Sumio Ogawa, Minoru Ueki 2006-05-30
6990173 Positioning apparatus, atmosphere substituting method, exposure apparatus, and device manufacturing method Eigo Kawakami 2006-01-24
6984362 Processing apparatus, measuring apparatus, and device manufacturing method Yutaka Tanaka, Shigeru Terashima, Takayuki Hasegawa, Shin Matsui 2006-01-10
6935576 Cleaning nozzle and cleaning apparatus 2005-08-30
6843471 Jetting apparatus for mixed flow of gas and liquid 2005-01-18
6836531 X-ray projection exposure apparatus and a device manufacturing method Masami Tsukamoto 2004-12-28
6804323 Mask pattern magnification correction method, magnification correction apparatus, and mask structure Akira Moriya, Takeshi Miyachi, Toshinobu Tokita 2004-10-12
6750946 Processing apparatus for processing sample in predetermined atmosphere Yutaka Tanaka, Shigeru Terashima 2004-06-15
6728332 X-ray mask, and exposure method and apparatus using the same Keiko Chiba, Masami Tsukamoto, Yutaka Watanabe, Hiroshi Maehara 2004-04-27
6714277 Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method Yutaka Tanaka, Kazuyuki Kasumi, Toru Hirabayashi 2004-03-30
6668037 X-ray projection exposure apparatus and a device manufacturing method Masami Tsukamoto 2003-12-23
6616898 Processing apparatus with pressure control and gas recirculation system Yutaka Tanaka, Shigeru Terashima, Takayuki Hasegawa, Shin Matsui 2003-09-09
6584168 X-ray projection exposure apparatus and a device manufacturing method Masami Tsukamoto 2003-06-24
6532182 Semiconductor memory production system and semiconductor memory production method Sumio Ogawa 2003-03-11
6422827 Injection apparatus for gas-liquid mixed flow 2002-07-23
6349240 Semiconductor device manufacturing system and method of manufacturing semiconductor devices Sumio Ogawa, Minoru Ueki 2002-02-19
6317479 X-ray mask, and exposure method and apparatus using the same Keiko Chiba, Masami Tsukamoto, Yutaka Watanabe, Hiroshi Maehara 2001-11-13