Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7069104 | Management system, management apparatus, management method, and device manufacturing method | Takehiko Suzuki, Hideki Ina, Takahiro Matsumoto, Satoru Oishi | 2006-06-27 |
| 7010380 | Management system, management method and apparatus, and management apparatus control method | Hideki Ina, Takehiko Suzuki, Takahiro Matsumoto, Satoru Oishi | 2006-03-07 |
| 6992780 | Position detecting method and apparatus, exposure apparatus and device manufacturing method | Hideki Ina, Takehiko Suzuki, Satoru Oishi | 2006-01-31 |
| 6992767 | Management system, apparatus, and method, exposure apparatus, and control method therefor | Takahiro Matsumoto, Hideki Ina, Takehiko Suzuki, Satoru Oishi | 2006-01-31 |
| 6950179 | Shape measuring apparatus, shape measuring method, and aligning method | Hideki Ina, Takahiro Matsumoto | 2005-09-27 |
| 6785583 | Management system and apparatus, method therefor, and device manufacturing method | Satoru Oishi, Hideki Ina, Takehiko Suzuki, Takahiro Matsumoto | 2004-08-31 |
| 6636303 | Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatus | Hideki Ina, Takahiro Matsumoto | 2003-10-21 |
| 6559924 | Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory | Hideki Ina, Takahiro Matsumoto | 2003-05-06 |
| 6529625 | Position detecting method and position detecting device for detecting relative positions of objects having position detecting marks by using separate reference member having alignment marks | Hideki Ina | 2003-03-04 |
| 6421124 | Position detecting system and device manufacturing method using the same | Takahiro Matsumoto | 2002-07-16 |
| 6154281 | Position detecting system and device manufacturing method using the same | Kenji Saitoh | 2000-11-28 |
| 6124922 | Exposure device and method for producing a mask for use in the device | — | 2000-09-26 |
| 6101237 | X-ray mask and X-ray exposure method using the same | Takeshi Miyachi, Keiko Chiba, Hiroshi Osawa, Hiroshi Maehara | 2000-08-08 |
| 5847974 | Measuring method and apparatus for measuring system having measurement error changeable with time | Tetsuzo Mori, Takahiro Matsumoto, Noriyasu Hasegawa | 1998-12-08 |
| 5818588 | Displacement measuring method and apparatus using plural light beam beat frequency signals | Takahiro Matsumoto | 1998-10-06 |
| 5751426 | Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object | Noriyuki Nose, Minoru Yoshii, Kenji Saitoh, Hiroshi Osawa, Toshihiko Tsuji +1 more | 1998-05-12 |
| 5717492 | Position detecting apparatus and a method for manufacturing semiconductor devices using the apparatus | Kenji Saitoh, Hiroshi Osawa, Masanobu Hasegawa | 1998-02-10 |
| 5682239 | Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters | Takahiro Matsumoto, Kenji Saitoh | 1997-10-28 |
| 5625453 | System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating | Takahiro Matsumoto, Yoshiaki Ohtsu, Kenji Saitoh | 1997-04-29 |
| 5610718 | Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes | Takahiro Matsumoto, Noriyuki Nose, Minoru Yoshii, Kenji Saitoh | 1997-03-11 |
| 5585923 | Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means | Noriyuki Nose, Takeshi Miyachi, Kenji Saitoh, Takahiro Matsumoto | 1996-12-17 |
| 5553110 | X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method | Kenji Saito, Keiko Chiba, Hiroshi Maehara | 1996-09-03 |
| 5550635 | Rotational deviation detecting method and system using a periodic pattern | Kenji Saitoh, Takahiro Matsumoto | 1996-08-27 |
| 5465148 | Apparatus and method for detecting the relative positional deviation between two diffraction gratings | Takahiro Matsumoto, Noriyuki Nose, Kenji Saito | 1995-11-07 |
| 5432603 | Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected | Noriyuki Nose, Minoru Yoshii, Kenji Saito, Toshihiko Tsuji, Takahiro Matsumoto | 1995-07-11 |