Issued Patents All Time
Showing 76–84 of 84 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5215619 | Magnetic field-enhanced plasma etch reactor | David Cheng, Dan Maydan, Kenneth R. Stalder, Dana L. Andrews, Mei Chang +4 more | 1993-06-01 |
| 5186718 | Staged-vacuum wafer processing system and method | Avi Tepman, Howard Grunes, Dan Maydan | 1993-02-16 |
| 4951601 | Multi-chamber integrated process system | Dan Maydan, David N. Wang, David Cheng, Masato Toshima, Isaac Harari +1 more | 1990-08-28 |
| 4911597 | Semiconductor processing system with robotic autoloader and load lock | Dan Maydan, Charles Ryan-Harris, Richard A. Seilheimer, David Cheng, Edward M. Abolnikov +5 more | 1990-03-27 |
| 4842683 | Magnetic field-enhanced plasma etch reactor | David Cheng, Dan Maydan, Kenneth R. Stalder, Dana L. Andrews, Mei Chang +4 more | 1989-06-27 |
| 4668338 | Magnetron-enhanced plasma etching process | Dan Maydan, Mei Cheng, David Cheng | 1987-05-26 |
| 4668365 | Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition | Robert F. Foster, David N. Wang, Dan Maydan | 1987-05-26 |
| 4618262 | Laser interferometer system and method for monitoring and controlling IC processing | Dan Maydan, Edward M. Kaczorowski | 1986-10-21 |
| 4231811 | Variable thickness self-aligned photoresist process | C. Norman Ahlquist | 1980-11-04 |