JF

Jianming Fu

Applied Materials: 66 patents #100 of 7,310Top 2%
Tesla: 22 patents #18 of 838Top 3%
SI Silevo: 6 patents #1 of 13Top 8%
EB Ebots: 1 patents #4 of 6Top 70%
📍 Palo Alto, CA: #118 of 9,675 inventorsTop 2%
🗺 California: #2,363 of 386,348 inventorsTop 1%
Overall (All Time): #15,428 of 4,157,543Top 1%
97
Patents All Time

Issued Patents All Time

Showing 76–97 of 97 patents

Patent #TitleCo-InventorsDate
6271592 Sputter deposited barrier layers Edwin Kim, Michael Nam, Chris Cha, Gongda Yao, Sophia Lee +2 more 2001-08-07
6251242 Magnetron and target producing an extended plasma region in a sputter reactor Praburam Gopalraja 2001-06-26
6238528 Plasma density modulator for improved plasma density uniformity and thickness uniformity in an ionized metal plasma source Zheng Xu, Fusen Chen 2001-05-29
6238803 Titanium nitride barrier layers Zheng Xu, Fusen Chen 2001-05-29
6228236 Sputter magnetron having two rotation diameters Michael Rosenstein, Leif DeLaurentis, James Van Gogh, Alan Liu 2001-05-08
6221221 Apparatus for providing RF return current path control in a semiconductor wafer processing system Ayad A. Al-Shaikh, Michael Rosenstein, Bradley O. Stimson, Praburam Gopalraja 2001-04-24
6183614 Rotating sputter magnetron assembly 2001-02-06
6176981 Wafer bias ring controlling the plasma potential in a sustained self-sputtering reactor Liubo Hong, John C. Forster 2001-01-23
6059945 Sputter target for eliminating redeposition on the target sidewall James Van Gogh 2000-05-09
6042706 Ionized PVD source to produce uniform low-particle deposition 2000-03-28
6007684 Process for forming improved titanium-containing barrier layers Fusen Chen 1999-12-28
5985759 Oxygen enhancement of ion metal plasma (IMP) sputter deposited barrier layers Edwin Kim, Michael Nam, Chris Cha, Gongda Yao, Sophia Lee +2 more 1999-11-16
5976334 Reliable sustained self-sputtering Zheng Xu 1999-11-02
5914018 Sputter target for eliminating redeposition on the target sidewall James Van Gogh 1999-06-22
5897752 Wafer bias ring in a sustained self-sputtering reactor Liubo Hong, John C. Forster 1999-04-27
5895266 Titanium nitride barrier layers Zheng Xu, Fusen Chen 1999-04-20
5876576 Apparatus for sputtering magnetic target materials 1999-03-02
5858184 Process for forming improved titanium-containing barrier layers Fusen Chen 1999-01-12
5851364 Method for forming aluminum contacts Zheng Xu 1998-12-22
5841624 Cover layer for a substrate support chuck and method of fabricating same Zheng Xu, Fusen Chen 1998-11-24
5736021 Electrically floating shield in a plasma reactor Peijun Ding, Zheng Xu 1998-04-07
5685960 Method for forming aluminum contacts Zheng Xu 1997-11-11