Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6358362 | Methods and arrangements for determining an endpoint for an in-situ local interconnect etching process | Allison Holbrook, Fei Wang | 2002-03-19 |
| 6303949 | Method and system for providing electrical insulation for local interconnect in a logic circuit | Sunil Mehta, Fei Wang, Stewart Logie | 2001-10-16 |
| 6297167 | In-situ etch of multiple layers during formation of local interconnects | Fei Wang, James Kai | 2001-10-02 |
| 6166428 | Formation of a barrier layer for tungsten damascene interconnects by nitrogen implantation of amorphous silicon or polysilicon | Sunil Mehta, Darin A. Chan, Raymond T. Lee | 2000-12-26 |
| 6121663 | Local interconnects for improved alignment tolerance and size reduction | Darin A. Chan, David K. Foote, Fei Wang, Minh Van Ngo | 2000-09-19 |
| 6114235 | Multipurpose cap layer dielectric | David K. Foote, Minh Van Ngo, Christopher F. Lyons, Fei Wang, Raymond T. Lee +2 more | 2000-09-05 |
| 6103611 | Methods and arrangements for improved spacer formation within a semiconductor device | Minh Van Ngo, Chih-Yuh Yang, David K. Foote, Scott A. Bell, Olov Karlsson +1 more | 2000-08-15 |
| 6087271 | Methods for removal of an anti-reflective coating following a resist protect etching process | Minh Van Ngo, Olov Karlsson, Christopher F. Lyons, Maria C. Chan | 2000-07-11 |
| 6066567 | Methods for in-situ removal of an anti-reflective coating during an oxide resistor protect etching process | Minh Van Ngo, Olov Karlsson | 2000-05-23 |
| 6060328 | Methods and arrangements for determining an endpoint for an in-situ local interconnect etching process | Allison Holbrook, Fei Wang | 2000-05-09 |
| 6060766 | Protection of hydrogen sensitive regions in semiconductor devices from the positive charge associated with plasma deposited barriers or layers | Sunil Mehta | 2000-05-09 |
| 6048761 | Method for manufacturing a semiconductor device with self-aligned protection diode | — | 2000-04-11 |
| 6027959 | Methods for in-situ removal of an anti-reflective coating during a nitride resistor protect etching process | Minh Van Ngo, Olov Karlsson, Maria C. Chan | 2000-02-22 |
| 5990524 | Silicon oxime spacer for preventing over-etching during local interconnect formation | Minh Van Ngo, Chih-Yuh Yang, David K. Foote, Scott A. Bell, Olov Karlsson +1 more | 1999-11-23 |
| 5963412 | Process induced charging damage control device | — | 1999-10-05 |
| 5956610 | Method and system for providing electrical insulation for local interconnect in a logic circuit | Sunil Mehta, Fei Wang, Stewart Logie | 1999-09-21 |
| 5900664 | Semiconductor device with self-aligned protection diode | — | 1999-05-04 |
| 5895269 | Methods for preventing deleterious punch-through during local interconnect formation | Fei Wang, Minh Van Ngo, Darin A. Chan, David K. Foote | 1999-04-20 |